Characterization of Ag oxide thin films prepared by reactive RF sputtering

Vacuum ◽  
2004 ◽  
Vol 76 (1) ◽  
pp. 1-6 ◽  
Author(s):  
Yoshio Abe ◽  
Tomoaki Hasegawa ◽  
Midori Kawamura ◽  
Katsutaka Sasaki
Keyword(s):  
Thin Films ◽  
Rf Sputtering ◽  
Oxide Thin Films

Raman and XPS characterization of vanadium oxide thin films deposited by reactive RF sputtering

1999 ◽  
Vol 56 (3-4) ◽  
pp. 249-258 ◽  
Author(s):  
E. Cazzanelli ◽  
G. Mariotto ◽  
S. Passerini ◽  
W.H. Smyrl ◽  
A. Gorenstein
Keyword(s):  
Thin Films ◽  
Vanadium Oxide ◽  
Rf Sputtering ◽  
Oxide Thin Films ◽  
Xps Characterization ◽  
Vanadium Oxide Thin Films

Characterization of Cu(InxGa1−x)2Se3.5 thin films prepared by rf sputtering

1998 ◽  
Vol 50 (1-4) ◽  
pp. 13-18 ◽  
Author(s):  
Tooru Tanaka ◽  
Nobutaka Tanahashi ◽  
Toshiyuki Yamaguchi ◽  
Akira Yoshida
Keyword(s):  
Thin Films ◽  
Rf Sputtering

Synthesis and characterization of tin (IV) oxide thin films

2021 ◽  
Vol 53 (5) ◽  
Author(s):  
M. Rahayi ◽  
M. H. Ehsani ◽  
Agnes C. Nkele ◽  
M. M. Shahidi ◽  
Fabian I. Ezema
Keyword(s):  
Thin Films ◽  
Synthesis And Characterization ◽  
Oxide Thin Films

Structural characterization of V2O5–TiO2 thin films deposited by RF sputtering from a titanium target with vanadium insets

2005 ◽  
Vol 109 (1) ◽  
pp. 47-51 ◽  
Author(s):  
I. Alessandri ◽  
E. Comini ◽  
E. Bontempi ◽  
G. Sberveglieri ◽  
L.E. Depero
Keyword(s):  
Thin Films ◽  
Structural Characterization ◽  
Rf Sputtering ◽  
Tio2 Thin Films ◽  
Titanium Target

Characterization of porous tin oxide thin films and their application to microsensor fabrication

1995 ◽  
Vol 25 (1-3) ◽  
pp. 482-485 ◽  
Author(s):  
Wan-Young Chung ◽  
Tae-Hoon Kim ◽  
Young-Ho Hong ◽  
Duk-Dong Lee
Keyword(s):  
Thin Films ◽  
Tin Oxide ◽  
Oxide Thin Films
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