Preparation and characterization of epitaxial MgO thin film by atmospheric-pressure metalorganic chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/s0022-0248(96)00411-3 ◽

1996 ◽

Vol 169 (3) ◽

pp. 474-479 ◽

Author(s):

J.M. Zeng ◽

H. Wang ◽

S.X. Shang ◽

Z. Wang ◽

M. Wang

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

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Characterization of InP/GaAs/Si structures grown by atmospheric pressure metalorganic chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.343043 ◽

1989 ◽

Vol 65 (3) ◽

pp. 1083-1088 ◽

Author(s):

S. J. Pearton ◽

K. T. Short ◽

A. T. Macrander ◽

C. R. Abernathy ◽

V. P. Mazzi ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

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Characterization of AlN:Mn thin film phosphors prepared by metalorganic chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/j.jcrysgro.2006.10.042 ◽

2007 ◽

Vol 298 ◽

pp. 379-382 ◽

Author(s):

Ayumu Sato ◽

Kyoko Azumada ◽

Toshiyuki Atsumori ◽

Kazuhiko Hara

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

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Structural characterization of ZnO nanopillars grown by atmospheric-pressure metalorganic chemical vapor deposition on vicinal 4H-SiC and SiO2/Si substrates

Journal of Applied Physics ◽

10.1063/1.3549140 ◽

2011 ◽

Vol 109 (4) ◽

pp. 043507-043507-8 ◽

Author(s):

I. Tsiaoussis ◽

V. Khranovskyy ◽

G. P. Dimitrakopulos ◽

J. Stoemenos ◽

R. Yakimova ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Structural Characterization ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Si Substrates ◽

Metalorganic Chemical

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Preparation and characterization of MgTiO3 thin films by atmospheric pressure metalorganic chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/s0022-0248(96)01177-3 ◽

1997 ◽

Vol 178 (3) ◽

pp. 355-359 ◽

Author(s):

Jianming Zeng ◽

Hong Wang ◽

Shigeng Song ◽

Qun Zhang ◽

Jiangong Cheng ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

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Metalorganic chemical vapor deposition and characterization of the In‐As‐Sb‐Bi material system for infrared detection

Applied Physics Letters ◽

10.1063/1.100350 ◽

1988 ◽

Vol 53 (2) ◽

pp. 142-144 ◽

Author(s):

T. P. Humphreys ◽

P. K. Chiang ◽

S. M. Bedair ◽

N. R. Parikh

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Infrared Detection ◽

Material System ◽

Metalorganic Chemical

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Ferroelectric SrBi2Ta2O9 thin film deposition at 550 °C by plasma-enhanced metalorganic chemical vapor deposition onto a metalorganic chemical vapor deposition platinum bottom electrode

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581554 ◽

1999 ◽

Vol 17 (1) ◽

pp. 83-87 ◽

Author(s):

Nak-Jin Seong ◽

Eun-Suck Choi ◽

Soon-Gil Yoon

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Bottom Electrode ◽

Chemical Vapor ◽

Thin Film Deposition ◽

Film Deposition ◽

Metalorganic Chemical

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Low-pressure Metalorganic Chemical Vapor Deposition and Characterization of YBa2Cu3O7−x Thin Films

Superconductivity and Applications ◽

10.1007/978-1-4684-7565-4_11 ◽

1990 ◽

pp. 127-138

Author(s):

P. Zawadzki ◽

G. S. Tompa ◽

P. Norris ◽

D. W. Noh ◽

B. Gallois ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Metalorganic Chemical

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Characterization of homoepitaxial YBa2Cu3Ox films grown by metalorganic chemical vapor deposition

Physica C Superconductivity ◽

10.1016/s0921-4534(97)00393-6 ◽

1997 ◽

Vol 282-287 ◽

pp. 587-588 ◽

Author(s):

H. Zama ◽

N. Tanaka ◽

S. Koyama ◽

T. Morishita

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

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Growth and Characterization of High-Speed Carbon-Doped-Base InP/InGaAs Heterojunction Bipolar Transistors by Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.35.3343 ◽

1996 ◽

Vol 35 (Part 1, No. 6A) ◽

pp. 3343-3349 ◽

Author(s):

Hiroshi Ito ◽

Shoji Yamahata ◽

Naoteru Shigekawa ◽

Kenji Kurishima ◽

Yutaka Matsuoka

Keyword(s):

Chemical Vapor Deposition ◽

Heterojunction Bipolar Transistors ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Bipolar Transistors ◽

Carbon Doped ◽

Metalorganic Chemical

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Preparation and Characterization of RuOxThin Films by Liquid Delivery Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.43.2667 ◽

2004 ◽

Vol 43 (5A) ◽

pp. 2667-2671 ◽

Author(s):

Kyoung-Won Kim ◽

Nam-Soo Kim ◽

Hyung-Gyoo Lee ◽

Yeong-Seuk Kim ◽

Hee-Jae Kang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical ◽

Liquid Delivery

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