Photoluminescence and structure of ZnO films deposited on Si substrates by metal-organic chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(01)01363-3 ◽

2002 ◽

Vol 402 (1-2) ◽

pp. 302-306 ◽

Author(s):

Zhuxi Fu ◽

Bixia Lin ◽

Jie Zu

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Zno Films ◽

Si Substrates ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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High-quality ZnO films grown by atmospheric pressure metal– organic chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/j.jcrysgro.2005.05.040 ◽

2005 ◽

Vol 283 (1-2) ◽

pp. 87-92 ◽

Author(s):

Li Wang ◽

Yong Pu ◽

Wenqing Fang ◽

Jiangnan Dai ◽

Yufeng Chen ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Organic Chemical ◽

Zno Films ◽

High Quality ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Growth of epitaxial bismuth ruthenate pyrochlore films on yttria-stabilized zirconia (YSZ) and YSZ-buffered Si substrates by metal–organic chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2018.10.052 ◽

2019 ◽

Vol 669 ◽

pp. 471-474

Author(s):

Hirokazu Chiba ◽

Rikyu Ikariyama ◽

Shintaro Yasui ◽

Hiroshi Funakubo

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Yttria Stabilized Zirconia ◽

Organic Chemical ◽

Stabilized Zirconia ◽

Si Substrates ◽

Bismuth Ruthenate ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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In-plane orientation and composition dependences of crystal structure and electrical properties of {100}-oriented Pb(Zr,Ti)O3films grown on (100) Si substrates by metal organic chemical vapor deposition

Japanese Journal of Applied Physics ◽

10.7567/jjap.56.10pf12 ◽

2017 ◽

Vol 56 (10S) ◽

pp. 10PF12 ◽

Author(s):

Shoji Okamoto ◽

P. S. Sankara Rama Krishnan ◽

Satoshi Okamoto ◽

Shintaro Yokoyama ◽

Kensuke Akiyama ◽

...

Keyword(s):

Crystal Structure ◽

Chemical Vapor Deposition ◽

Electrical Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Si Substrates ◽

Plane Orientation ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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NH3-assisted growth approach for ZnO films by atmospheric pressure metal-organic chemical vapor deposition

Applied Physics A ◽

10.1007/s00339-007-4248-6 ◽

2007 ◽

Vol 89 (3) ◽

pp. 645-650 ◽

Author(s):

Jiangnan Dai ◽

Fengyi Jiang ◽

Yong Pu ◽

Li Wang ◽

Wenqing Fang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Organic Chemical ◽

Zno Films ◽

Metal Organic ◽

Growth Approach ◽

Organic Chemical Vapor Deposition

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Growth of arsenic doped ZnO films using a finite surface doping source by metal organic chemical vapor deposition

Optical Materials Express ◽

10.1364/ome.6.003733 ◽

2016 ◽

Vol 6 (12) ◽

pp. 3733 ◽

Author(s):

Tian-Hong Feng ◽

Xiao-Chuan Xia

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Zno Films ◽

Surface Doping ◽

Metal Organic ◽

Doped Zno ◽

Organic Chemical Vapor Deposition

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Dysprosium Scandate Thin Films Prepared by Metal Organic Chemical Vapor Deposition on Pt/TiOx/SiO2/Si Substrates for MIM Capacitor Applications.

ECS Transactions ◽

10.1149/1.2779588 ◽

2019 ◽

Vol 11 (4) ◽

pp. 529-540 ◽

Author(s):

Reji Thomas ◽

Naba K. Karan ◽

Peter Ehrhart ◽

Rainer Waser ◽

Ram S Katiyar

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Si Substrates ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Reduction of nonradiative recombination center for ZnO films grown under Zn-rich conditions by metal organic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.3492855 ◽

2010 ◽

Vol 97 (13) ◽

pp. 131913 ◽

Author(s):

Eiji Fujimoto ◽

Kenji Watanabe ◽

Yuji. Matsumoto ◽

Hideomi Koinuma ◽

Masatomo Sumiya

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Recombination Center ◽

Organic Chemical ◽

Zno Films ◽

Nonradiative Recombination ◽

Nonradiative Recombination Center ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Dysprosium Scandate Thin Films Prepared by Metal Organic Chemical Vapor Deposition on Pt/Ti/SiO2/Si Substrates for MIM Capacitor Applications.

ECS Meeting Abstracts ◽

10.1149/ma2007-02/20/1151 ◽

2007 ◽

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Si Substrates ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Growth and Characterization of Crack-Free Semi-Polar (1-101) GaN on 7°-off (001) Si Substrates by Metal-Organic Chemical Vapor Deposition

ECS Journal of Solid State Science and Technology ◽

10.1149/2.001308jss ◽

2013 ◽

Vol 2 (8) ◽

pp. N3001-N3005 ◽

Author(s):

Hsueh-Hsing Liu ◽

Hsien-Yu Lin ◽

Chen-Zi Liao ◽

Jen-Inn Chyi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Si Substrates ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Characterizations of gallium-doped ZnO films on glass substrate prepared by atmospheric pressure metal-organic chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2009.03.194 ◽

2009 ◽

Vol 517 (18) ◽

pp. 5537-5542 ◽

Author(s):

Yen-Chin Huang ◽

Zhen-Yu Li ◽

Hung-hsin Chen ◽

Wu-Yih Uen ◽

Shan-Ming Lan ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Glass Substrate ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Organic Chemical ◽

Zno Films ◽

Metal Organic ◽

Doped Zno ◽

Organic Chemical Vapor Deposition

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