A new class of Ti–Si–C–N coatings obtained by chemical vapor deposition, Part III: 650–800 °C process
Keyword(s):
Keyword(s):
1995 ◽
Vol 53
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pp. 256-257
Keyword(s):
1989 ◽
Vol 47
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pp. 608-609
2001 ◽
Vol 11
(PR3)
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pp. Pr3-885-Pr3-892
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Keyword(s):
2001 ◽
Vol 11
(PR3)
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pp. Pr3-691-Pr3-702
2002 ◽
Vol 12
(4)
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pp. 69-74
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