Effect of H2 and N2 in the remote plasma enhanced metal organic chemical vapor deposition of TiN from tetrakis-diethyl-amido-titanium
1998 ◽
Vol 189-190
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pp. 321-324
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1996 ◽
Vol 13
(5)
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pp. 510-514
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2004 ◽
Vol 43
(10)
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pp. 6963-6967
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1998 ◽
Vol 37
(Part 1, No. 12A)
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pp. 6502-6505
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2004 ◽
Vol 43
(11A)
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pp. 7672-7676
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2003 ◽
Vol 21
(4)
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pp. 1033-1037
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