New approach of Monte Carlo simulation for low energy electron beam lithography

1998 ◽  
Vol 41-42 ◽  
pp. 179-182 ◽  
Author(s):  
Soo-Hwan Kim ◽  
Young-Mog Ham ◽  
Wongyu Lee ◽  
Kukjin Chun
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Electron Beam ◽  
Electron Beam Lithography ◽  
Low Energy ◽  
Energy Electron ◽  
New Approach ◽  
Low Energy Electron

Edge Roughness Study of Chemically Amplified Resist in Low-Energy Electron-Beam Lithography Using Computer Simulation

2002 ◽  
Vol 41 (Part 1, No. 6B) ◽  
pp. 4157-4162 ◽  
Author(s):  
Tetsuro Nakasugi ◽  
Atsushi Ando ◽  
Ryoichi Inanami ◽  
Noriaki Sasaki ◽  
Kazuyoshi Sugihara ◽  
...  
Keyword(s):  
Computer Simulation ◽  
Electron Beam ◽  
Electron Beam Lithography ◽  
Low Energy ◽  
Energy Electron ◽  
Chemically Amplified ◽  
Edge Roughness ◽  
Chemically Amplified Resist ◽  
Low Energy Electron

Nanometer Patterning by Focused Low Energy Electron Beam Lithography

1987 ◽  
Vol 26 (Part 2, No. 7) ◽  
pp. L1165-L1167
Author(s):  
Akio Sugita ◽  
Masami Kakuchi ◽  
Toshiaki Tamamura
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Low Energy ◽  
Energy Electron ◽  
Low Energy Electron

Charge induced pattern distortion in low energy electron beam lithography

2000 ◽  
Vol 18 (6) ◽  
pp. 3122 ◽  
Author(s):  
K. M. Satyalakshmi ◽  
A. Olkhovets ◽  
M. G. Metzler ◽  
C. K. Harnett ◽  
D. M. Tanenbaum ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Low Energy ◽  
Energy Electron ◽  
Low Energy Electron

New registration technique using voltage-contrast images for low-energy electron-beam lithography

2001 ◽  
Author(s):  
Tetsuro Nakasugi ◽  
Atsushi Ando ◽  
Kazuyoshi Sugihara ◽  
Motosuke Miyoshi ◽  
Katsuya Okumura
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Low Energy ◽  
Energy Electron ◽  
Low Energy Electron ◽  
Voltage Contrast
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