Effect of surface treatment of Si substrate on the crystal structure of FeSi2 thin film formed by ion beam sputter deposition method

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ◽

10.1016/s0168-583x(03)00752-3 ◽

2003 ◽

Vol 206 ◽

pp. 313-316 ◽

Author(s):

M. Haraguchi ◽

H. Yamamoto ◽

K. Yamaguchi ◽

T. Nakanoya ◽

T. Saito ◽

...

Keyword(s):

Thin Film ◽

Crystal Structure ◽

Surface Treatment ◽

Ion Beam ◽

Sputter Deposition ◽

Deposition Method ◽

Si Substrate ◽

Ion Beam Sputter Deposition ◽

Effect Of Surface

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Effect of Irradiation Atmospheres on the Film Growth of Iron Oxide on Si Substrate by Ion Beam Sputter Deposition Method

5th Asia-Pacific Conference on Semiconducting Silicides and Related Materials (APAC-Silicide 2019) ◽

10.7567/jjapcp.8.011201 ◽

2020 ◽

Author(s):

K. Yamanaka ◽

K. Yamaguchi

Keyword(s):

Film Growth ◽

Ion Beam ◽

Sputter Deposition ◽

Deposition Method ◽

Si Substrate ◽

Ion Beam Sputter Deposition

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Sputter etching effect of the substrate on the microstructure of β-FeSi2 thin film prepared by ion beam sputter deposition method

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ◽

10.1016/j.nimb.2007.01.041 ◽

2007 ◽

Vol 257 (1-2) ◽

pp. 186-189 ◽

Author(s):

M. Sasase ◽

K. Shimura ◽

K. Yamaguchi ◽

H. Yamamoto ◽

S. Shamoto ◽

...

Keyword(s):

Thin Film ◽

Ion Beam ◽

Sputter Deposition ◽

Deposition Method ◽

Ion Beam Sputter Deposition ◽

Etching Effect ◽

Sputter Etching

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Photoluminescence of β-FeSi2 thin film prepared by ion beam sputter deposition method

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ◽

10.1016/j.nimb.2005.08.175 ◽

2006 ◽

Vol 242 (1-2) ◽

pp. 673-675 ◽

Author(s):

K. Shimura ◽

K. Yamaguchi ◽

H. Yamamoto ◽

M. Sasase ◽

S. Shamoto ◽

...

Keyword(s):

Thin Film ◽

Ion Beam ◽

Sputter Deposition ◽

Deposition Method ◽

Ion Beam Sputter Deposition

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3D simulation of thin film growth conditions at ion beam sputter deposition and comparison to experimental investigations

10.1117/12.246794 ◽

1996 ◽

Author(s):

Markus Tilsch ◽

Volker Scheuer ◽

Jochen Biersack ◽

Theo T. Tschudi

Keyword(s):

Thin Film ◽

Film Growth ◽

Ion Beam ◽

Growth Conditions ◽

Sputter Deposition ◽

Thin Film Growth ◽

3D Simulation ◽

Experimental Investigations ◽

Ion Beam Sputter Deposition

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Effect of surface morphology of metallic zinc films deposited by ion beam sputter deposition on the formation of ZnO nanowires

Vacuum ◽

10.1016/j.vacuum.2011.06.020 ◽

2011 ◽

Vol 86 (3) ◽

pp. 295-298 ◽

Author(s):

Liang-Chiun Chao ◽

Ching-Fu Lin ◽

Chung-Chi Liau

Keyword(s):

Surface Morphology ◽

Ion Beam ◽

Sputter Deposition ◽

Zno Nanowires ◽

Metallic Zinc ◽

Ion Beam Sputter Deposition ◽

Effect Of Surface

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Characterization of nanocrystalline indium tin oxide thin films prepared by ion beam sputter deposition method

Thin Solid Films ◽

10.1016/j.tsf.2010.07.034 ◽

2010 ◽

Vol 518 (23) ◽

pp. 6891-6896 ◽

Author(s):

S. Venkatachalam ◽

Hiroshi Nanjo ◽

Fathy M.B. Hassan ◽

Kazunori Kawasaki ◽

Mitsuhiro Kanakubo ◽

...

Keyword(s):

Tin Oxide ◽

Indium Tin Oxide ◽

Ion Beam ◽

Sputter Deposition ◽

Deposition Method ◽

Oxide Thin Films ◽

Ion Beam Sputter Deposition

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Ion beam sputter deposition allows tailoring of thin film properties

Scilight ◽

10.1063/1.5086197 ◽

2018 ◽

Vol 2018 (51) ◽

pp. 510013

Author(s):

Chris Patrick

Keyword(s):

Thin Film ◽

Ion Beam ◽

Sputter Deposition ◽

Film Properties ◽

Ion Beam Sputter Deposition

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Effect of target compositions on the crystallinity of β-FeSi2 prepared by ion beam sputter deposition method

Thin Solid Films ◽

10.1016/j.tsf.2004.02.052 ◽

2004 ◽

Vol 461 (1) ◽

pp. 17-21 ◽

Author(s):

K Yamaguchi ◽

A Heya ◽

K Shimura ◽

T Katsumata ◽

H Yamamoto ◽

...

Keyword(s):

Ion Beam ◽

Sputter Deposition ◽

Deposition Method ◽

Ion Beam Sputter Deposition

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Properties of Indium Tin Oxide Thin Films Deposited on Glass and Clay Substrates by Ion-Beam Sputter Deposition Method

Japanese Journal of Applied Physics ◽

10.7567/jjap.50.01ak03 ◽

2011 ◽

Vol 50 (1S1) ◽

pp. 01AK03 ◽

Author(s):

Shanmugam Venkatachalam ◽

Hiroshi Nanjo ◽

Fathy M. B. Hassan ◽

Kazunori Kawasaki ◽

Yoshito Wakui ◽

...

Keyword(s):

Tin Oxide ◽

Indium Tin Oxide ◽

Ion Beam ◽

Sputter Deposition ◽

Deposition Method ◽

Oxide Thin Films ◽

Ion Beam Sputter Deposition

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Properties of Indium Tin Oxide Thin Films Deposited on Glass and Clay Substrates by Ion-Beam Sputter Deposition Method

Japanese Journal of Applied Physics ◽

10.1143/jjap.50.01ak03 ◽

2011 ◽

Vol 50 ◽

pp. 01AK03 ◽

Author(s):

Shanmugam Venkatachalam ◽

Hiroshi Nanjo ◽

Fathy M. B. Hassan ◽

Kazunori Kawasaki ◽

Yoshito Wakui ◽

...

Keyword(s):

Tin Oxide ◽

Indium Tin Oxide ◽

Ion Beam ◽

Sputter Deposition ◽

Deposition Method ◽

Oxide Thin Films ◽

Ion Beam Sputter Deposition

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