3D simulation of thin film growth conditions at ion beam sputter deposition and comparison to experimental investigations

1996 ◽  
Author(s):  
Markus Tilsch ◽  
Volker Scheuer ◽  
Jochen Biersack ◽  
Theo T. Tschudi
2019 ◽  
Vol 123 (33) ◽  
pp. 20257-20269 ◽  
Author(s):  
K. Szajna ◽  
M. Kratzer ◽  
W. Belza ◽  
A. Hinaut ◽  
D. Wrana ◽  
...  

2008 ◽  
Vol 18 (8) ◽  
pp. 1329-1339 ◽  
Author(s):  
Brooks A. Jones ◽  
Antonio Facchetti ◽  
Michael R. Wasielewski ◽  
Tobin J. Marks

2001 ◽  
Vol 229 (1-4) ◽  
pp. 415-418 ◽  
Author(s):  
M. Tada ◽  
J. Yamada ◽  
V.V. Srinivasu ◽  
V. Sreedevi ◽  
H. Kohmoto ◽  
...  

2012 ◽  
Vol 26 (15) ◽  
pp. 1250087 ◽  
Author(s):  
PATCHA CHATRAPHORN ◽  
CHANAKAN CHOMNGAM

Most studies of thin film growth simulations are performed on flat substrates. However, in reality, a substrate is usually miscut leading to a vicinal surface with a small tilt. The goal of this work is to study effects of an initial configuration of a miscut substrate on the grown film. The Das Sarma–Tamborenea model with modified diffusion rules is used for the simulations. The modification is done to allow variation in the surface diffusion length and mobility of adatoms. The results show that the optimum conditions that lead to step-flow growth are long diffusion length and small step height.


Sign in / Sign up

Export Citation Format

Share Document