Generation of pulsed direct-current plasma above 100 torr for large area diamond deposition

Considering the relationship between thin film thickness of transparent conductive oxide (TCO) materials and the reversed pulse time in pulsed-direct current (DC) sputtering, aluminum-doped zinc oxide (AZO) films were deposited on glass substrates at different reversed pulse times by changing oxygen/argon (O2/Ar) gas ratios for window layers of large area CuIn1-xGaxSe2 (CIGS) solar cells. As a result of the reduced sputtering time, the thickness of AZO film was decreased when the reversed pulsed time was increased. The higher resistance and resistivity of the AZO film was obtained at a higher reversed pulse time. From the structural investigations of AZO such as transmittance and X-ray diffraction (XRD), it was possible to observe the relationship between the crystallinity of AZO and transmittance. Even at the short reversed pulse time of 0.5 µs, it can be concluded that the accumulated charges on the AZO target are completely cleared and the AZO layers show the highest figure of merit (FOM) with low sheet resistance and high transmittance.

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Effects of fast monoenergetic electrons on the ion dynamics near the cathode in a pulsed direct current plasma sheath

Physics of Plasmas ◽

10.1063/1.2895380 ◽

2008 ◽

Vol 15 (3) ◽

pp. 033503 ◽

Cited By ~ 7

Author(s):

M. Sharifian ◽

B. Shokri

Keyword(s):

Direct Current ◽

Plasma Sheath ◽

Ion Dynamics ◽

Direct Current Plasma ◽

Pulsed Direct Current

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Rotating Stall Control in an Axial Fan with Pulsed-Direct-Current Plasma Actuation

Journal of Propulsion and Power ◽

10.2514/1.b37267 ◽

2020 ◽

Vol 36 (2) ◽

pp. 177-190

Author(s):

Ryan C. McGowan ◽

Thomas C. Corke ◽

Eric H. Matlis ◽

Richard W. Kaszeta ◽

Calman Gold

Keyword(s):

Direct Current ◽

Rotating Stall ◽

Axial Fan ◽

Plasma Actuation ◽

Direct Current Plasma ◽

Stall Control ◽

Pulsed Direct Current

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The large area deposition of diamond by the multi-cathode direct current plasma assisted chemical vapor deposition (DC PACVD) method

Diamond and Related Materials ◽

10.1016/s0925-9635(01)00625-2 ◽

2002 ◽

Vol 11 (3-6) ◽

pp. 463-466 ◽

Cited By ~ 20

Author(s):

Jae-Kap Lee ◽

Kwang Yong Eun ◽

Young-Joon Baik ◽

Hui Jun Cheon ◽

Jea Weon Rhyu ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Direct Current ◽

Vapor Deposition ◽

Chemical Vapor ◽

Large Area ◽

Direct Current Plasma ◽

Area Deposition

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Direct Current and Pulsed Direct Current Plasma Nitriding of Ferrous Materials a Critical Review

Acta Mechanica et Automatica ◽

10.1515/ama-2016-0024 ◽

2016 ◽

Vol 10 (2) ◽

pp. 150-158 ◽

Cited By ~ 1

Author(s):

Magdalena Łępicka ◽

Małgorzata Grądzka-Dahlke

Keyword(s):

Direct Current ◽

Plasma Nitriding ◽

White Layer ◽

Ion Nitriding ◽

Corrosion Properties ◽

Direct Current Plasma ◽

Wear And Corrosion ◽

Mechanical And Corrosion Properties ◽

Pulsed Direct Current ◽

Subsequent Diffusion

Abstract Nowadays, the improvement of ferrous materials performance is a problem of high interest. One of well-known wear- and corrosion properties improving technique is plasma nitriding, in which elemental nitrogen is introduced to the surface of a metal part for subsequent diffusion into the material. As a result, a compound, “white” layer and a diffusion zone are formed at the detail’s surface. Most of the authors positively describe the effects of surface ion nitiding. On the other hand, there are also reports on adverse effects of direct current and pulsed direct current plasma nitriding on ferrous materials performance. Therefore, an attempt to provide comprehensive summary on direct current and pulsed direct current ion nitriding and its influence on ferrous materials’ mechanical and corrosion properties has been made. According to the results, some of the technique drawbacks are hard to avoid in mass production.

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