E and H regimes of plasma enhanced chemical vapor deposition of diamond-like carbon film in low frequency inductively coupled plasma reactor

Carbon nanofibers (CNFs) were synthesized by both high-density plasma-enhanced chemical vapor deposition (CVD) and thermal CVD. The growth in the former was carried out in an inductively coupled plasma (ICP) reactor. The multilayer loop structure, which was reported to be found on both the inner and outer surfaces of cup-stacked-type CNFs grown using thermal CVD only after heat treatment above 1500 °C, was observed in the as-grown CNFs only on the outer surface using ICP-CVD. The dangling bonds caused by plasma etching and the bonding between edge carbon atoms aided by the high-density plasma are considered the main reasons of the formation of multilayer loops.

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X-ray reflectometry study of diamond-like carbon films prepared by plasma enhanced chemical vapor deposition in a low pressure inductively coupled plasma

Thin Solid Films ◽

10.1016/j.tsf.2013.04.033 ◽

2013 ◽

Vol 537 ◽

pp. 102-107

Author(s):

F. Salah ◽

B. Harzallah ◽

A. van der Lee ◽

B. Angleraud ◽

T. Begou ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Low Pressure ◽

Carbon Films ◽

Diamond Like Carbon ◽

X Ray ◽

Inductively Coupled

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The effect of the substrate bias voltage and the deposition pressure on the properties of diamond-like carbon produced by inductively coupled plasma assisted chemical vapor deposition

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2004.07.027 ◽

2005 ◽

Vol 193 (1-3) ◽

pp. 255-258 ◽

Cited By ~ 12

Author(s):

H. Kim ◽

D.H. Jung ◽

B. Park ◽

K.C. Yoo ◽

J.J. Lee ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Bias Voltage ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Diamond Like Carbon ◽

Substrate Bias ◽

Deposition Pressure ◽

Substrate Bias Voltage ◽

Inductively Coupled

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Application of radio frequency inductively coupled plasma in chemical vapor deposition process of diamond-like carbon films for modification of properties of deposited films

Materials Science-Poland ◽

10.1515/msp-2017-0119 ◽

2018 ◽

Vol 36 (1) ◽

pp. 80-85

Author(s):

Wojciech Kijaszek ◽

Waldemar Oleszkiewicz ◽

Zbigniew Znamirowski

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Field Emission ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Structural Damage ◽

Chemical Vapor ◽

Excitation Wavelength ◽

Diamond Like Carbon ◽

Inductively Coupled

Abstract The authors have deposited the diamond-like carbon (DLC) films by radio frequency inductively coupled plasma enhanced chemical vapor deposition (RF ICP PECVD) method. The investigated DLC films with different sp3 fraction content were deposited on polished and textured silicon substrates. The sp3 fraction content of the deposited DLC films was ranging from 35 % to 70 % and was estimated from acquired Raman scattering spectra (excitation wavelength: 325 nm and 514.5 nm). The measurements of field emission characteristics were carried out in diode configuration. Emission properties of the DLC films were calculated from Fowler-Nordheim plots. The calculated electric field enhancement factor β was ranging from 56 to 198 for the DLC films deposited on polished substrates and from 115 to 445 for films deposited on textured substrates. The surface of the DLC films was observed by scanning electron microscope (SEM) after field emission measurements. The acquired SEM images reveled that the activation of field emission from the DLC films is connected with generation of structural damage to the DLC films.

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