The influence of boron doping on the structure and characteristics of diamond thin films

1997 ◽  
Vol 6 (2-4) ◽  
pp. 521-525 ◽  
Author(s):  
X.Z. Liao ◽  
R.J. Zhang ◽  
C.S. Lee ◽  
S.Tong Lee ◽  
Y.W. Lam
1989 ◽  
Vol 55 (11) ◽  
pp. 1121-1123 ◽  
Author(s):  
J. Mort ◽  
D. Kuhman ◽  
M. Machonkin ◽  
M. Morgan ◽  
F. Jansen ◽  
...  

1993 ◽  
Vol 11 (3) ◽  
pp. 569-573 ◽  
Author(s):  
R. Shinar ◽  
M. Leksono ◽  
H. R. Shanks

2012 ◽  
Vol 14 (10) ◽  
pp. 905-908
Author(s):  
Liwei Xiong ◽  
Jianhua Wang ◽  
Fan Liu ◽  
Weidong Man ◽  
Jun Weng ◽  
...  

2006 ◽  
Vol 100 (12) ◽  
pp. 124506 ◽  
Author(s):  
M. Roy ◽  
A. K. Dua ◽  
J. Nuwad ◽  
K. G. Girija ◽  
A. K. Tyagi ◽  
...  

Author(s):  
J.B. Posthill ◽  
R.P. Burns ◽  
R.A. Rudder ◽  
Y.H. Lee ◽  
R.J. Markunas ◽  
...  

Because of diamond’s wide band gap, high thermal conductivity, high breakdown voltage and high radiation resistance, there is a growing interest in developing diamond-based devices for several new and demanding electronic applications. In developing this technology, there are several new challenges to be overcome. Much of our effort has been directed at developing a diamond deposition process that will permit controlled, epitaxial growth. Also, because of cost and size considerations, it is mandatory that a non-native substrate be developed for heteroepitaxial nucleation and growth of diamond thin films. To this end, we are currently investigating the use of Ni single crystals on which different types of epitaxial metals are grown by molecular beam epitaxy (MBE) for lattice matching to diamond as well as surface chemistry modification. This contribution reports briefly on our microscopic observations that are integral to these endeavors.


Author(s):  
Jean-Paul Mazellier ◽  
Cyril Di Giola ◽  
Pierre Legagneux ◽  
Clément Hébert ◽  
Emmanuel Scorsone ◽  
...  

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