Controlled in situ boron doping of diamond thin films using solution phase

2006 ◽  
Vol 100 (12) ◽  
pp. 124506 ◽  
Author(s):  
M. Roy ◽  
A. K. Dua ◽  
J. Nuwad ◽  
K. G. Girija ◽  
A. K. Tyagi ◽  
...  
Keyword(s):  
Thin Films ◽  
Boron Doping ◽  
Solution Phase ◽  
Diamond Thin Films

The influence of boron doping on the structure and characteristics of diamond thin films

1997 ◽  
Vol 6 (2-4) ◽  
pp. 521-525 ◽  
Author(s):  
X.Z. Liao ◽  
R.J. Zhang ◽  
C.S. Lee ◽  
S.Tong Lee ◽  
Y.W. Lam
Keyword(s):  
Thin Films ◽  
Boron Doping ◽  
Diamond Thin Films

Boron doping of diamond thin films

1989 ◽  
Vol 55 (11) ◽  
pp. 1121-1123 ◽  
Author(s):  
J. Mort ◽  
D. Kuhman ◽  
M. Machonkin ◽  
M. Morgan ◽  
F. Jansen ◽  
...  
Keyword(s):  
Thin Films ◽  
Boron Doping ◽  
Diamond Thin Films

Effect of boron doping on the surfaces of diamond thin films

1993 ◽  
Vol 11 (3) ◽  
pp. 569-573 ◽  
Author(s):  
R. Shinar ◽  
M. Leksono ◽  
H. R. Shanks
Keyword(s):  
Thin Films ◽  
Boron Doping ◽  
Diamond Thin Films

Study on the growth of CVD diamond thin films by in situ reflectivity measurement

2002 ◽  
Vol 11 (11) ◽  
pp. 1871-1875 ◽  
Author(s):  
Jinlong Luo ◽  
Xuantong Ying ◽  
Peinan Wang ◽  
Liangyao Chen
Keyword(s):  
Thin Films ◽  
Cvd Diamond ◽  
Reflectivity Measurement ◽  
Diamond Thin Films

In-situ boron doping of chemical-bath deposited CdS thin films

2009 ◽  
Vol 206 (2) ◽  
pp. 256-262 ◽  
Author(s):  
Hani Khallaf ◽  
Guangyu Chai ◽  
Oleg Lupan ◽  
Lee Chow ◽  
Helge Heinrich ◽  
...  
Keyword(s):  
Thin Films ◽  
Boron Doping ◽  
Cds Thin Films

Deposition and Boron Doping of Nano-Crystalline Diamond Thin Films on Poly-Crystalline Diamond Thick Films

2012 ◽  
Vol 14 (10) ◽  
pp. 905-908
Author(s):  
Liwei Xiong ◽  
Jianhua Wang ◽  
Fan Liu ◽  
Weidong Man ◽  
Jun Weng ◽  
...  
Keyword(s):  
Thin Films ◽  
Thick Films ◽  
Boron Doping ◽  
Nano Crystalline ◽  
Diamond Thin Films ◽  
Poly Crystalline Diamond

Nucleation and Early Growth of Sputtered thin Films

1970 ◽  
Vol 28 ◽  
pp. 516-517
Author(s):  
Dudley M. Sherman ◽  
Thos. E. Hutchinson
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Ion Beam ◽  
Ion Source ◽  
Water Cooling ◽  
Stages Of Growth ◽  
Lens Assembly ◽  
Microscope Technique ◽  
Ion Beam Sputter Deposition

The in situ electron microscope technique has been shown to be a powerful method for investigating the nucleation and growth of thin films formed by vacuum vapor deposition. The nucleation and early stages of growth of metal deposits formed by ion beam sputter-deposition are now being studied by the in situ technique.A duoplasmatron ion source and lens assembly has been attached to one side of the universal chamber of an RCA EMU-4 microscope and a sputtering target inserted into the chamber from the opposite side. The material to be deposited, in disc form, is bonded to the end of an electrically isolated copper rod that has provisions for target water cooling. The ion beam is normal to the microscope electron beam and the target is placed adjacent to the electron beam above the specimen hot stage, as shown in Figure 1.

Sign in / Sign up

Export Citation Format

Share Document