Free-standing diamond wafers deposited by multi-cathode, direct-current, plasma-assisted chemical vapor deposition

Diamond and Related Materials ◽

10.1016/s0925-9635(99)00336-2 ◽

2000 ◽

Vol 9 (3-6) ◽

pp. 364-367 ◽

Author(s):

Jae-Kap Lee ◽

Kwang Yong Eun ◽

Hee-Baik Chae ◽

Young-Joon Baik

Keyword(s):

Chemical Vapor Deposition ◽

Direct Current ◽

Vapor Deposition ◽

Chemical Vapor ◽

Free Standing ◽

Direct Current Plasma

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Nitrogen-incorporated multiwalled carbon nanotubes grown by direct current plasma-enhanced chemical vapor deposition

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1924419 ◽

2005 ◽

Vol 23 (3) ◽

pp. 930 ◽

Author(s):

Ji Hoon Yang ◽

Bub Jin Kim ◽

Yun Hee Kim ◽

Young Jin Lee ◽

Byung Ho Ha ◽

...

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Multiwalled Carbon Nanotubes ◽

Direct Current ◽

Vapor Deposition ◽

Chemical Vapor ◽

Multiwalled Carbon ◽

Direct Current Plasma

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Some novel aspects of nanocrystalline diamond nucleation and growth by direct current plasma assisted chemical vapor deposition

Diamond and Related Materials ◽

10.1016/j.diamond.2010.08.006 ◽

2010 ◽

Vol 19 (11) ◽

pp. 1393-1400 ◽

Author(s):

Hak-Joo Lee ◽

H. Li ◽

Hyeongtag Jeon ◽

Wook-Seong Lee

Keyword(s):

Chemical Vapor Deposition ◽

Direct Current ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nucleation And Growth ◽

Nanocrystalline Diamond ◽

Diamond Nucleation ◽

Direct Current Plasma

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An Insight into Grain Refinement Mechanism of Ultrananocrystalline Diamond Films Obtained by Direct Current Plasma-Assisted Chemical Vapor Deposition

Plasma Processes and Polymers ◽

10.1002/ppap.201300146 ◽

2014 ◽

Vol 11 (5) ◽

pp. 437-447

Author(s):

Hak-Joo Lee ◽

Jung-Min Cho ◽

Inho Kim ◽

Seung-Cheol Lee ◽

Jong-Keuk Park ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Grain Refinement ◽

Direct Current ◽

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Ultrananocrystalline Diamond ◽

Direct Current Plasma ◽

Refinement Mechanism ◽

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Ultrananocrystalline diamond film deposition by direct-current plasma assisted chemical vapor deposition using hydrogen-rich precursor gas in the absence of the positive column

Journal of Applied Physics ◽

10.1063/1.3533764 ◽

2011 ◽

Vol 109 (2) ◽

pp. 023303 ◽

Author(s):

Hak-Joo Lee ◽

Hyeongtag Jeon ◽

Wook-Seong Lee

Keyword(s):

Chemical Vapor Deposition ◽

Direct Current ◽

Diamond Film ◽

Vapor Deposition ◽

Positive Column ◽

Chemical Vapor ◽

Film Deposition ◽

Ultrananocrystalline Diamond ◽

Direct Current Plasma

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The synthesis of graphene nanowalls on a diamond film on a silicon substrate by direct-current plasma chemical vapor deposition

Carbon ◽

10.1016/j.carbon.2012.10.038 ◽

2013 ◽

Vol 53 ◽

pp. 120-129 ◽

Author(s):

Yonhua Tzeng ◽

Wai Leong Chen ◽

Chiahao Wu ◽

Jui-Yung Lo ◽

Chiuan-Yi Li

Keyword(s):

Chemical Vapor Deposition ◽

Direct Current ◽

Diamond Film ◽

Vapor Deposition ◽

Silicon Substrate ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Plasma

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Physics of Direct Current Plasma-Enhanced Chemical Vapor Deposition

Aligned Carbon Nanotubes - NanoScience and Technology ◽

10.1007/978-3-642-30490-3_5 ◽

2012 ◽

pp. 93-109 ◽

Author(s):

Zhifeng Ren ◽

Yucheng Lan ◽

Yang Wang

Keyword(s):

Chemical Vapor Deposition ◽

Direct Current ◽

Vapor Deposition ◽

Chemical Vapor ◽

Direct Current Plasma

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Structure, mechanical, and frictional properties of hydrogenated fullerene-like amorphous carbon film prepared by direct current plasma enhanced chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.4959216 ◽

2016 ◽

Vol 120 (4) ◽

pp. 045303 ◽

Author(s):

Yongfu Wang ◽

Kaixiong Gao ◽

Junyan Zhang

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Direct Current ◽

Vapor Deposition ◽

Carbon Film ◽

Chemical Vapor ◽

Amorphous Carbon Film ◽

Frictional Properties ◽

Direct Current Plasma

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Nanocrystalline Diamond Films Deposited by the Hot Cathode Direct Current Plasma Chemical Vapor Deposition Method with Different Compositions of CH4/Ar/H2Gas Mixture

The Journal of Physical Chemistry C ◽

10.1021/jp710082n ◽

2008 ◽

Vol 112 (5) ◽

pp. 1401-1406 ◽

Author(s):

Leyong Zeng ◽

Hongyan Peng ◽

Weibiao Wang ◽

Yuqiang Chen ◽

Da Lei ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Direct Current ◽

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Plasma

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Study on the use of CuSnTi brazing alloy for induction brazing of diamond grits surface-treated by direct current plasma chemical vapor deposition

International Journal of Refractory Metals and Hard Materials ◽

10.1016/j.ijrmhm.2013.05.006 ◽

2013 ◽

Vol 41 ◽

pp. 339-344 ◽

Author(s):

Bojiang Ma ◽

Feng Lian

Keyword(s):

Chemical Vapor Deposition ◽

Direct Current ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Induction Brazing ◽

Direct Current Plasma

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Growth and Field-Emission Properties of Well-Aligned Carbon Nanotubes by Direct Current Plasma Enhanced Chemical Vapor Deposition

Shinku ◽

10.3131/jvsj.46.412 ◽

2003 ◽

Vol 46 (5) ◽

pp. 412-415

Author(s):

Mizuho KOGA ◽

Keisuke UEDA ◽

Yasuaki HAYASHI ◽

Shigehiro NISHINO

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Field Emission ◽

Direct Current ◽

Vapor Deposition ◽

Chemical Vapor ◽

Emission Properties ◽

Field Emission Properties ◽

Direct Current Plasma ◽

Aligned Carbon Nanotubes

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