Structure, mechanical, and frictional properties of hydrogenated fullerene-like amorphous carbon film prepared by direct current plasma enhanced chemical vapor deposition

Yongfu Wang; Kaixiong Gao; Junyan Zhang

doi:10.1063/1.4959216

Structure, mechanical, and frictional properties of hydrogenated fullerene-like amorphous carbon film prepared by direct current plasma enhanced chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.4959216 ◽

2016 ◽

Vol 120 (4) ◽

pp. 045303 ◽

Cited By ~ 14

Author(s):

Yongfu Wang ◽

Kaixiong Gao ◽

Junyan Zhang

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Direct Current ◽

Vapor Deposition ◽

Carbon Film ◽

Chemical Vapor ◽

Amorphous Carbon Film ◽

Frictional Properties ◽

Direct Current Plasma

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Infrared Spectroscopic Study on Deposition Process of the Amorphous Carbon Film with Benzene Molecule as a Source in Plasma Enhanced Chemical Vapor Deposition

Proceedings of the 12th Asia Pacific Physics Conference (APPC12) ◽

10.7566/jpscp.1.015081 ◽

2014 ◽

Cited By ~ 1

Author(s):

Masanori Shinohara ◽

Yujiro Taniguchi ◽

Yuya Takaki ◽

Shohei Yagi ◽

Yoshinobu Matsuda ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Spectroscopic Study ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Carbon Film ◽

Chemical Vapor ◽

Deposition Process ◽

Benzene Molecule ◽

Infrared Spectroscopic Study ◽

Amorphous Carbon Film

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Boron-doped amorphous carbon film grown by bias assisted pyrolysis chemical vapor deposition

IEICE Electronics Express ◽

10.1587/elex.11.20140937 ◽

2015 ◽

Vol 12 (3) ◽

pp. 20140937-20140937 ◽

Cited By ~ 2

Author(s):

Ishak Annuar ◽

Jalal Rouhi ◽

Mohamad Rusop

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Carbon Film ◽

Chemical Vapor ◽

Amorphous Carbon Film ◽

Boron Doped

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Tribological properties of nitrogen-containing amorphous carbon film produced by dc plasma chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1521966 ◽

2003 ◽

Vol 21 (1) ◽

pp. 6-13 ◽

Cited By ~ 10

Author(s):

Wei Zhang ◽

Koichiro Wazumi ◽

Akihiro Tanaka ◽

Yoshinori Koga

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Tribological Properties ◽

Vapor Deposition ◽

Carbon Film ◽

Chemical Vapor ◽

Plasma Chemical ◽

Dc Plasma ◽

Amorphous Carbon Film ◽

Plasma Chemical Vapor Deposition

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Hot-filament chemical vapor deposition of amorphous carbon film on diamond grits and induction brazing of the diamond grits

Applied Surface Science ◽

10.1016/j.apsusc.2012.01.074 ◽

2012 ◽

Vol 258 (10) ◽

pp. 4750-4755 ◽

Cited By ~ 12

Author(s):

Bojiang Ma ◽

Qingxian Yu

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Carbon Film ◽

Chemical Vapor ◽

Amorphous Carbon Film ◽

Induction Brazing ◽

Hot Filament

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Observation of Plasma Chemical Vapor Deposition Process of Amorphous Carbon Film

Hyomen Kagaku ◽

10.1380/jsssj.31.156 ◽

2010 ◽

Vol 31 (3) ◽

pp. 156-161

Author(s):

Masanori SHINOHARA ◽

Yoshinobu MATSUDA ◽

Hiroshi FUJIYAMA ◽

Tatsuyuki NAKATANI

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Carbon Film ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Plasma Chemical ◽

Amorphous Carbon Film ◽

Plasma Chemical Vapor Deposition

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Nitrogenated amorphous carbon film by thermal chemical vapor deposition

RSM 2013 IEEE Regional Symposium on Micro and Nanoelectronics ◽

10.1109/rsm.2013.6706517 ◽

2013 ◽

Author(s):

F. Mohamad ◽

M. Rusop

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Carbon Film ◽

Chemical Vapor ◽

Amorphous Carbon Film ◽

Thermal Chemical Vapor Deposition

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Nitrogen-incorporated multiwalled carbon nanotubes grown by direct current plasma-enhanced chemical vapor deposition

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1924419 ◽

2005 ◽

Vol 23 (3) ◽

pp. 930 ◽

Cited By ~ 10

Author(s):

Ji Hoon Yang ◽

Bub Jin Kim ◽

Yun Hee Kim ◽

Young Jin Lee ◽

Byung Ho Ha ◽

...

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Multiwalled Carbon Nanotubes ◽

Direct Current ◽

Vapor Deposition ◽

Chemical Vapor ◽

Multiwalled Carbon ◽

Direct Current Plasma

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Hydrogenated amorphous carbon nitride films on Si(100) deposited by direct current saddle-field plasma-enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581919 ◽

1999 ◽

Vol 17 (5) ◽

pp. 2607-2611 ◽

Cited By ~ 5

Author(s):

H. K. Jang ◽

G. Kim ◽

Y. S. Lee ◽

S. W. Whangbo ◽

C. N. Whang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Direct Current ◽

Vapor Deposition ◽

Carbon Nitride ◽

Chemical Vapor ◽

Hydrogenated Amorphous Carbon ◽

Amorphous Carbon Nitride ◽

Hydrogenated Amorphous

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Some novel aspects of nanocrystalline diamond nucleation and growth by direct current plasma assisted chemical vapor deposition

Diamond and Related Materials ◽

10.1016/j.diamond.2010.08.006 ◽

2010 ◽

Vol 19 (11) ◽

pp. 1393-1400 ◽

Cited By ~ 12

Author(s):

Hak-Joo Lee ◽

H. Li ◽

Hyeongtag Jeon ◽

Wook-Seong Lee

Keyword(s):

Chemical Vapor Deposition ◽

Direct Current ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nucleation And Growth ◽

Nanocrystalline Diamond ◽

Diamond Nucleation ◽

Direct Current Plasma

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An Insight into Grain Refinement Mechanism of Ultrananocrystalline Diamond Films Obtained by Direct Current Plasma-Assisted Chemical Vapor Deposition

Plasma Processes and Polymers ◽

10.1002/ppap.201300146 ◽

2014 ◽

Vol 11 (5) ◽

pp. 437-447

Author(s):

Hak-Joo Lee ◽

Jung-Min Cho ◽

Inho Kim ◽

Seung-Cheol Lee ◽

Jong-Keuk Park ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Grain Refinement ◽

Direct Current ◽

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Ultrananocrystalline Diamond ◽

Direct Current Plasma ◽

Refinement Mechanism ◽

Insight Into

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