Irradiation behavior of pyrolytic silicon carbide

Author(s):  
R. J. Lauf

Fuel particles for the High-Temperature Gas-Cooled Reactor (HTGR) contain a layer of pyrolytic silicon carbide to act as a miniature pressure vessel and primary fission product barrier. Optimization of the SiC with respect to fuel performance involves four areas of study: (a) characterization of as-deposited SiC coatings; (b) thermodynamics and kinetics of chemical reactions between SiC and fission products; (c) irradiation behavior of SiC in the absence of fission products; and (d) combined effects of irradiation and fission products. This paper reports the behavior of SiC deposited on inert microspheres and irradiated to fast neutron fluences typical of HTGR fuel at end-of-life.

Author(s):  
R. J. Lauf

Fuel particles for the High Temperature Gas-Cooled Reactor (HTGR) contain a layer of pyrolytic silicon carbide to act as a miniature pressure vessel and primary fission product barrier. Optimization of the SiC coating with respect to fuel performance involves four areas of study: (a) characterization of as-deposited SiC coatings; (b) thermodynamics and kinetics of chemical reactions between SiC and fission products; (c) irradiation behavior of SiC in the absence of fission products; and (d) the combined effects of irradiation and fission product interactions. This paper reports the behavior of SiC deposited on fissile fuel particles and irradiated to fast neutron fluences typical of HTGR fuel at end-of-life.


Author(s):  
R. J. Lauf ◽  
D. N. Braski

Fuel particles for the High-Temperature Gas-Cooled Reactor (HTGR) contain layers of pyrolytic carbon and silicon carbide, which act as a miniature pressure vessel and form the primary fission product barrier. Of the many fission products formed during irradiation, the noble metals are of particular interest because they interact significantly with the SiC layer and their concentrations are somewhat higher in the low-enriched uranium fuels currently under consideration. To study fission product-SiC interactions, particles of UO2 or UC2 are doped with fission product elements before coating and are then held in a thermal gradient up to several thousand hours. Examination of the SiC coatings by TEM-AEM after annealing shows that silver behaves differently from the palladium group.


1991 ◽  
Vol 26 (9) ◽  
pp. 2379-2388 ◽  
Author(s):  
Kazuo Minato ◽  
Toru Ogawa ◽  
Satoru Kashimura ◽  
Kousaku Fukuda ◽  
Ishio Takahashi ◽  
...  

1984 ◽  
Vol 40 ◽  
Author(s):  
W. M. Kriven ◽  
S. H. Risbud

AbstractThe interfacial zones in copper-magnesium aluminosilicate materials were characterized by several microscopic and microchemical techniques. Interfaces between copper-glass, copper-partially crystallized glass, and copper-fully crystallized glass were studied with the specific goal of determining the oxidation state of copper in various locations in the microstructure of the reaction zones. Optical microscopy, cathodoluminescence, electron probe microanalysis (EPMA), SEM, TEM, and other microtechniques were used. The presence of copper in various oxidation states can be attributed to the thermodynamics and kinetics of the system. Results correlating the observed interfacial microstructure and the thermochemistry of the system are presented.


1993 ◽  
Vol 202 (1-2) ◽  
pp. 47-53 ◽  
Author(s):  
Kazuo Minato ◽  
Toru Ogawa ◽  
Kousaku Fukuda ◽  
Hajime Sekino ◽  
Hideyuki Miyanishi ◽  
...  

2010 ◽  
Vol 177 ◽  
pp. 78-81
Author(s):  
Fan Tao Meng ◽  
Shan Yi Du ◽  
Yu Min Zhang

Silicon carbide prepared by chemical vapor deposition (CVD) is one of the important candidate materials for space mirror and high-power mirror such as laser mirror, because of its superior performances such as low density, high melting point and homogeneity. In this paper, the SiC coatings were deposited on the substrates of reaction bonded silicon carbide (RB-SiC) by CVD process. Then, the morphologies of the deposits were examined with scanning electron microscopy. The crystalline phase of the as-deposited films was confirmed with X-ray diffractometry. And the adhesion between the CVD film and the substrate was rated with scraping method. As a result, the morphologies of the deposits, i.e. whiskers at 1050°C or films at 1100°C, are different from that of the substrate. And the mean diameter of the deposits at 1100°C is larger than that at 1050°C. Furthermore, the crystalline phase of the as-deposited film is determined as β-SiC and the adhesion is firm enough not to be peeled off with the scraping test.


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