Atomic-level imaging of the surface structure of Ag2O

Author(s):  
William Krakow

In recent years electron microscopy has been used to image surfaces in both the transmission and reflection modes by many research groups. Some of this work has been performed under ultra high vacuum conditions (UHV) and apparent surface reconstructions observed. The level of resolution generally has been at least an order of magnitude worse than is necessary to visualize atoms directly and therefore the detailed atomic rearrangements of the surface are not known. The present author has achieved atomic level resolution under normal vacuum conditions of various Au surfaces. Unfortunately these samples were exposed to atmosphere and could not be cleaned in a standard high resolution electron microscope. The result obtained surfaces which were impurity stabilized and reveal the bulk lattice (1x1) type surface structures also encountered by other surface physics techniques under impure or overlayer contaminant conditions. It was therefore decided to study a system where exposure to air was unimportant by using a oxygen saturated structure, Ag2O, and seeking to find surface reconstructions, which will now be described.

1997 ◽  
Vol 472 ◽  
Author(s):  
T. Braisaz ◽  
P. Ruterana ◽  
G. Nouet ◽  
Ph. Komninou ◽  
Th. Kehagias ◽  
...  

ABSTRACTHigh resolution electron microscopy has been used to characterize the structure of ultra thin films of titanium deposited on KBr substrate by Ultra High Vacuum (UHV) electron-gun evaporation. The size of the grains has an order of magnitude of 10 nm whatever the substrate temperature. The observations have been carried out along <1123> zone axis. Some of the grains contain planar defects which were identified as the twin {1011}. The atomic structure of this twin is characterized by a mirror plane similar to that observed in polycrystalline titanium. Additionaly, this structure can be modified by a b2/2 twinning dislocation.


Author(s):  
William Goldfarb ◽  
Benjamin M. Siegel

The image collecting system of the experimental high resolution electron microscope being developed in this laboratory must be compatible with the ultra-high vacuum (10−10Torr) maintained in the total column. The characteristics of an SEC porous KCl target used to record directly the primary high energy beam has been previously reported. It was also noted that a phosphor transducer could be used with an external recording medium without loss of information if adequate electron optical magnification and sufficient light coupling are utilized.


Author(s):  
D. L. Musinski ◽  
S. T. Wang ◽  
B. M. Siegel

The specimen environment for high resolution microscopy of biomolecular materials is critical. To obtain the optimum conditions we maintain the specimen in an ultra high vacuum (10-10 Torr) and at liquid helium temperatures to minimize contamination and hopefully radiation damage. To meet these specifications, the imaging system composed of the cryostat shown in the schematic drawing was developed and constructed. Besides assuring that the basic design does not limit the desired resolution, our cryostat offers the maximum in engineering flexibility so alternate lens configurations or even extensive design modifications are relatively easy to accomplish.


Author(s):  
Ping Lu ◽  
David J. Smith

Surface profile imaging at resolutions of better than 2Å is highly suitable for studies of surface structures and reactions. In the case of semiconductor materials, the main challenge is to prepare surfaces free of any contamination. The technique has previously been used to study surface reconstructions of Si and CdTe. In our previous observations, clean surfaces of CdTe were obtained by careful control of the incident electron beam within a JEM-4000EX high resolution electron microscope with a pressure of 10-7 torr. In the present study, observations of reconstructions and dynamic phenomena on CdTe surfaces were carried out with a Phillips-430ST, modified for Ultra-High Vacuum in the vicinity of the specimen and equipped with an in situ heating facility. The base vacuum in the region of the sample could usually reach ∼3×l0-9 torr after baking the microscope column at ∼120°C for 36 hours. The CdTe specimen was prepared by cutting a large single crystal into 3mm discs in a [110] direction, then mechanically polishing to a thickness of ∼20 microns, and finally ion milling to perforation.When viewed along a [110] projection, the CdTe sample was found to be dominated by clean or nearly clean (111) and (110) surfaces(with amorphous materials less than 5Å) whilst the (001) surface was usually very short and rough. A completely clean surface was obtained by in situ annealing of the crystal to about 200°. The (110) surface was then found to be reconstructed with a very characteristic chevron appearance in the manner described previously. Long and flat CdTe(OOl) surfaces were obtained by insitu annealing of the crystal at ∼510°C at which temperature edges of the crystal started to gradually sublime. Characterization of the surface structure was then possible when the crystal was cooled back down to temperatures below about 300°C. It was found that the (001) surface had a (2×1) reconstruction at temperatures below about 200°C which transformed reversibly into a (3×1) reconstruction over the approximate temperature range of 200°C<T<300°C. Figures la and lb show the (2×1) and (3×1) reconstructed (001) surfaces, viewed along the [110] projection, which were recorded at temperatures of 140°C and 240°C respectively. Structural models for the (2×1) and (3×1) reconstructions, obtained directly on the basis of the experimental images, are shown in Figs.2a and 2b respectively. The (2×1) reconstruction involves a 1/2 monolayer of Cd vacancies and a very large inward contraction of the remaining Cd surface atoms, which then displace the second layer of Te atoms as indicated. This model is similar to that proposed by Chadi for the Ga-rich (2×1) reconstructed GaAs(100) surface. The (3×1) reconstruction involves both the formation of surface dimers and the presence of vacancies at the surface. Every third atomic-pair is missing along the [1,-1,0] direction, and the remaining two atom pairs at the surface form the surface dimer. Although the (3×1) reconstruction has a larger number of electrons in dangling bonds, a surface with vacancies can be relaxed to reduce the strain energy due to the surface dimers. The directions of the atomic displacements away from the ideal dimer positions are indicated in the figure. Relatively large atomic displacements for several layers into the bulk are clearly visible in experimental images, as seen in Fig.lb. Further details of the surface reconstructions can be found elsewhere.


1986 ◽  
Vol 67 ◽  
Author(s):  
N. Otsuka ◽  
C. Choi ◽  
Y. Nakamura ◽  
S. Nagakura ◽  
R. Fischer ◽  
...  

ABSTRACTRecent studies have shown that high quality GaAs films can be grown by MBE on Si substrates whose surfaces are slightly tilted from the (100) plane. In order to investigate the effect of the tilting of substrate surfaces on the formation of threading dislocations, the GaAs/Si epitaxial interfaces have been observed with a 1 MB ultra-high vacuum, high voltage electron microscope. Two types of misfit dislocations, one with Burgers vectors parallel to the interface and the other with Burgers vectors inclined from the interface, were found in these epitaxial interfaces. The observation of crosssectional samples perpendicular to each other has shown that the tilting of the substrate surface directly influences the generation of these two types of misfit dislocations. The mechanism of the reduction of threading dislocations by the tilting of the substrate surface is discussed based on these observations.


1988 ◽  
Vol 131 ◽  
Author(s):  
Z. C. Ying ◽  
W. Ho

ABSTRACTThe adsorption, thermoreactions, and photoreactions of NO coadsorbed with K on Si(111)7×7 at 90 K have been studied and compared with the results obtained from the Kfree surface. The experiments were performed under ultra-high vacuum conditions using high resolution electron energy loss spectroscopy, work function change measurements, and mass spectrometry. NO adsorbs both molecularly and dissociatively on the K-free surface. Two molecular N–O stretching modes are observed at 188 and 225 meV. The concentration of these NO molecules on the surface decreases as the K exposure increases and vanishes at high K exposures. A new N–O stretching mode, attributed to adsorption of NO molecules on K clusters, is observed at 157 meV. After thermal heating or photon irradiation, the surface is covered with atomic O and N. The surface is more oxidized in the presence of K. A steady decrease in the photodesorption cross section is observed as the K exposure increases and is attributed to K-induced band structure changes.


Author(s):  
A. Tonomura ◽  
T. Komoda

We have developed a field emission electron microscope. Although field emission gun requires ultra high vacuum and skillful technique, it brings about the favorable characteristics of high brightness and small energy spread. This characteristics will enable a significant progress in coherent electron optics and high resolution electron microscopy, especially in electron beam holography.Its column is Hitachi HU-11C Electron Microscope modified for ultra high vacuum operation, and it is evacuated with five ion pumps. Field emission gun is divided into two parts and is evacuated differentially with two ion pumps and a sublimation pump. The final pressures in these rooms are 5x10-10 Torr and 5x10-8 Torr respectively.


1993 ◽  
Vol 1 (5) ◽  
pp. 4-4
Author(s):  
Michael M. Kersker

There remains two basic axioms of all microscopists: the first….if you look, you're bound to see something, and the second….not everything you will see is artifact. These axioms apply particularly well to scanning probe microscopy at the molecular and atomic level. Fortunately, coarser resolution images share comforting similarities with images from other established scanning methods. Holes in optical discs look like holes when probed with AFM tips, and these holes look very much like SEM images, a subject with which we have some familiarity. At the molecular and atomic level, however, the scanning probe instruments may or may not be “seeing” the sample, though they are clearly seeing something.Comparison of surface structure observed with indirect surface structural measurements, for example by LEED (Low Energy Electron Diffraction) or RHEED (Reflection High Energy Electron Diffraction) usually under ultra-high vacuum conditions can lead, by inference, to an understanding of the real bulk or average surface structure.


Author(s):  
Francesco Braghin ◽  
Elisabetta Leo ◽  
Ferruccio Resta

Except for MEMS working in ultra high vacuum, the main cause of damping is the air surrounding the system. When the working pressure is equal to the atmospheric one (from now on called “high pressure”, i.e. 105Pa), the mean free path of an air molecule is much smaller than typical MEMS dimensions. Thus, air can be considered as a viscous fluid and two phenomena occur: flow damping and squeeze film damping. These two terms can be evaluated through a simplified Navies-Stocks equation. In vacuum (from now on called “low pressure”, i.e. 26Pa), the air cannot be considered as a viscous fluid any more since the free path of an air molecule is of the same order of magnitude of typical MEMS dimensions. Thus, the molecular fluid theory must be used to estimate the damping. To predict the damping of a MEMS device both at high and low pressure levels, a multi-physics code was used and the achieved numerical results were compared to experimental data measured on the same device.


1996 ◽  
Vol 438 ◽  
Author(s):  
F. Czerwinski ◽  
J. A. Szpunar

AbstractThe effect of implantation with 2×1016 ions/cm2 at 150 keV Ce+on the oxidation of polycrystalline high purity Ni was examined. The radiation damage and distribution of Ce implants in Ni substrate were additionally modified by post-implantation ultra-high vacuum annealing at 1073 K. Ce implants decreased the Ni oxidation rate at 973 K by approximately one order of magnitude, and this reduction was similar to that achieved by 14 nm thick CeO2 sol-gel coatings and by 4 nm thick coatings of CeO2 deposited on the same substrate by reactive sputtering. Physical damage introduced by radiation caused a slight increase in oxidation rate during the very initial stages. However, the essential improvement in the oxidation resistance was derived entirely from the chemical role of the implants. The beneficial effect of Ce was reduced when the implanted Ni substrate was vacuum-annealed prior to the oxidation.


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