Low-Energy Electron Induced X-Ray Spectroscopy (LEEIXS), An Emerging Technique in Surface and Thin-Film Analysis. New Developments and Applications

Within the last two decades analysis and characterization of surfaces, interfaces and very thin films have become of considerable importance in many fields of modern technology. This increasing demand has lead to a rapid development of various surface and near-surface analytical techniques. Some of these methods such as XPS, AES, SIMS and ISS have matured both with respect to instrumentation and methodology and therefore are now sufficiently well-established. Others are yet in their infancy but possess a large potential and this is the case of low-energy electron induced x-ray spectrometry (LEEIXS) discussed hereafter.The instrument is a wavelength-dispersive x-ray spectrometer in which the conventional x-ray tube has been replaced by an electronically stabilized gas-discharge source. Such a system operates as an electron source under the primary vacuum of the spectrometer (≃ 10−1 torr). Typical operating conditions are in the range 0.5-5 kV with a current of 0.1-0.5 mA and the diameter of the electron beam at the sample surface is less than 1 cm2.

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Surface and near-surface chemical characterization by low-energy electron-induced X-ray spectrometry (LEEIXS): A review

X-Ray Spectrometry ◽

10.1002/xrs.1300160104 ◽

1987 ◽

Vol 16 (1) ◽

pp. 7-16 ◽

Cited By ~ 41

Author(s):

M. Romand ◽

R. Bador ◽

M. Charbonnier ◽

F. Gaillard

Keyword(s):

Chemical Characterization ◽

Low Energy ◽

Energy Electron ◽

Surface Chemical ◽

Near Surface ◽

X Ray ◽

Low Energy Electron

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Neutron Scattering Studies of Surfaces and Interfaces

MRS Bulletin ◽

10.1557/s0883769400058383 ◽

1990 ◽

Vol 15 (11) ◽

pp. 65-72 ◽

Cited By ~ 17

Author(s):

Charles F. Majkrzak ◽

Gian P. Felcher

Keyword(s):

Thin Film Deposition ◽

Film Deposition ◽

Low Energy ◽

Energy Electron ◽

Scattering Data ◽

X Rays ◽

Near Surface ◽

X Ray ◽

Surfaces And Interfaces ◽

Low Energy Electron

During the past decade, scientific and technological interest in the properties of surfaces and interfaces has grown at an astounding rate. On first thought, one might not consider a neutron or even an x-ray photon to be a particularly sensitive surface probe given their relatively weak interactions with matter compared to that of a low-energy electron or atom. Indeed, low-energy electron diffraction and atomic beam scattering techniques have contributed significantly to our understanding of surface phenomena. Nonetheless, the very fact that electrons and atoms are so strongly interacting makes quantitative analysis of their scattering data difficult. The interaction of neutrons or x-rays with matter, on the other hand, is weak enough that the potential can be characterized by a relatively simple scattering amplitude. Presently attainable neutron intensities, though not yet comparable to those of x-ray synchrotron sources, are still of sufficient strength to permit a variety of surface or near surface reflectivity and grazing angle diffraction experiments. Because neutrons can distinguish between different isotopes of the same element, most notably hydrogen and deuterium, as well as couple to atomic magnetic moments via a dipolar interaction, they can be indispensable and complementary probes.More conventional neutron diffraction techniques can also be applied to the study of interfacial phenomena and the effects of reduced dimensionality and compositional modulation in super-lattice structures grown by a variety of thin film deposition methods. In this article we will differentiate between reflectivity and diffraction measurements as follows: if the scattering occurs at a wavevector transfer low enough that the scattering medium appears as a continuum, so that amorphous and crystalline states are indistinguishable, then it will be considered to be in the reflectivity regime whereas diffraction will be taken to correspond to higher wavevector transfer where the precise arrangement of atoms is discernible.

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