Energy Filtering of Schottky Field Emission Gun Using Fringe Field Monochromator

1999 ◽  
Vol 5 (S2) ◽  
pp. 646-647
Author(s):  
H.W. Mook ◽  
A.H.V. van Veen ◽  
P. Kruit
Keyword(s):  
Field Emission ◽  
Low Voltage ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Electron Gun ◽  
Fringe Field ◽  
Objective Lens ◽  
Electronic Band ◽  
Energy Width ◽  
Energy Filtering

The energy resolution which can be attained in electron energy loss spectroscopy (EELS) is determined by the energy spread of the electron source. The energy width of a high brightness electron gun (typically 0.4 to 0.8 eV) blurs the energy spectrum. A pre-specimen energy filter or monochromator must be used to reduce the energy width of the beam below 0.1 eV to allow detailed EELS analysis of the electronic band structures in materials. The monochromator can not only improve EELS, but it is also capable of improving the spatial resolution in low voltage SEM, which is limited by the chromatic blur of the objective lens. A new type of monochromator the Fringe Field Monochromator has been designed and experiments in an ultra high vacuum setup show the monochromatisation of a Schottky Field Emission Gun.

A Field Emission System For Transmission Electron Microscopy

1973 ◽  
Vol 31 ◽  
pp. 298-299
Author(s):  
Michel Troyonal ◽  
Huei Pei Kuoal ◽  
Benjamin M. Siegelal
Keyword(s):  
Electron Microscope ◽  
Field Emission ◽  
Optical System ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Objective Lens ◽  
Electron Optical System ◽  
Cross Sectional ◽  
Transmission Electron ◽  
Emission System

A field emission system for our experimental ultra high vacuum electron microscope has been designed, constructed and tested. The electron optical system is based on the prototype whose performance has already been reported. A cross-sectional schematic illustrating the field emission source, preaccelerator lens and accelerator is given in Fig. 1. This field emission system is designed to be used with an electron microscope operated at 100-150kV in the conventional transmission mode. The electron optical system used to control the imaging of the field emission beam on the specimen consists of a weak condenser lens and the pre-field of a strong objective lens. The pre-accelerator lens is an einzel lens and is operated together with the accelerator in the constant angular magnification mode (CAM).

A low-voltage field-emission column with a Schottky emitter

1984 ◽  
Vol 42 ◽  
pp. 454-457
Author(s):  
D.W. Tuggle ◽  
S.G. Watson
Keyword(s):  
Field Emission ◽  
Low Voltage ◽  
High Current Density ◽  
High Vacuum ◽  
Energy Spread ◽  
Electron Gun ◽  
Emission Current ◽  
High Current ◽  
Field Mode ◽  
Over The Top

The advantages of a room-temperature field emission (FE) cathode for forming a sub-micrometer high current, low voltage electron probe, namely small energy spread, high brightness and a small virtual source diameter are somewhat offset by the high vacuum required in the electron gun and the fluctuations in the emission current. The thermal-field mode of operation, with its relaxed vacuum requirements and relatively stable emission current has the disadvantage of an increased energy spread of emission, which degrades the spatial resolution of a focused beam. A Schottky point emitter, similar in geometry to a field emitter but with a larger radius, can achieve high current density by use of a low work function surface operating at elevated temperature. In the Schottky emission (SE) mode, electron transmission over the top of the potential barrier rather than tunneling through the barrier is the emission mechanism.

A New High Resolution Field Emission SEM with Variable Pressure Capabilities

2001 ◽  
Vol 7 (S2) ◽  
pp. 880-881 ◽  
Author(s):  
Peter Gnauck ◽  
Volker Drexel ◽  
J. Greiser
Keyword(s):  
High Resolution ◽  
Field Emission ◽  
Low Voltage ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Chamber Pressure ◽  
Variable Pressure ◽  
Natural State ◽  
Electron Microscopes ◽  
Scanning Electron

To examine non conductive samples in their natural state (i.e. without significant sample preparation) at high resolution in the SEM the technique of low voltage field emission scanning electron microscopy (LVFESEM) is used. Due to the limitation in accelerating voltage (U<1kV) this technique is limited in respect of chemical analysis. Furthermore it is not possible to examine humid and outgassing samples in high vacuum. in recent years the application of variable pressure scanning electron microscopes (VPSEM) became an important technique in materials science as well as in life science. Due to the capability of maintaining a high chamber pressure humid, outgassing and non-conductive samples, can be examined in their natural state without significant sample modification or preparation. Especially compound materials with different electron yields can be imaged without any charging effects (Fig. 2), [2]. This paper describes a high resolution field emission electron microscope, that combines low voltage and variable pressure capabilities.The high pressure capabilities of the instrument are realized by eliminating the high vacuum requirements of SEM in the microscope chamber. This is done by separating the vacuum environment in the chamber from the ultra high vacuum environment in the gun area.

Low-energy point-reflection EM

1995 ◽  
Vol 53 ◽  
pp. 610-611
Author(s):  
J. C. H. Spence ◽  
X. Zhang ◽  
J. M. Zuo ◽  
U. Weierstall ◽  
E. Munro ◽  
...  
Keyword(s):  
Low Voltage ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Experimental Point ◽  
Crystalline Substrate ◽  
Point Reflection ◽  
Reflection Geometry ◽  
Optical Analog ◽  
Point Projection ◽  
Atomically Flat

The limited penetration of the low-voltage point-projection microscope (PPM) may be avoided by using the reflection geometry to image clean surfaces in ultra-high vacuum. Figure 1 shows the geometry we are using for experimental point-reflection (PRM) imaging. A nanotip field-emitter at about 100 - 1000 volts is placed above a grounded atomically flat crystalline substrate, which acts as a mirror and anode. Since most of the potential is dropped very close to the tip, trajectories are reasonably straight if the sample is in the far-field of the tip. A resolution of 10 nm is sought initially. The specular divergent RHEED beam then defines a virtual source S' below the surface, resulting in an equivalent arrangement to PPM (or defocused CBED). Shadow images of surface asperities are then expected on the distant detector, out of focus by the tip-to-sample distance. These images can be interpreted as in-line electron holograms and so reconstructed (see X. Zhang et al, these proceedings). Optical analog experiments confirm the absence of foreshortening when the detector is parallel to the surface.

Comparison of freeze-fractured yeast replicas using conventional TEM and low-voltage field-emission SEM

1989 ◽  
Vol 47 ◽  
pp. 74-75
Author(s):  
William P. Wergin ◽  
Eric F. Erbe ◽  
Terrence W. Reilly
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Field Emission ◽  
Low Voltage ◽  
Objective Lens ◽  
Specimen Preparation ◽  
Lens System ◽  
Air Drying ◽  
Preparation Techniques ◽  
Scanning Electron

Although the first commercial scanning electron microscope (SEM) was introduced in 1965, the limited resolution and the lack of preparation techniques initially confined biological observations to relatively low magnification images showing anatomical surface features of samples that withstood the artifacts associated with air drying. As the design of instrumentation improved and the techniques for specimen preparation developed, the SEM allowed biologists to gain additional insights not only on the external features of samples but on the internal structure of tissues as well. By 1985, the resolution of the conventional SEM had reached 3 - 5 nm; however most biological samples still required a conductive coating of 20 - 30 nm that prevented investigators from approaching the level of information that was available with various TEM techniques. Recently, a new SEM design combined a condenser-objective lens system with a field emission electron source.

CNT field emission based ultra-high vacuum measurements

2015 ◽  
Author(s):  
Jian Zhang ◽  
Yangyang Zhao ◽  
Yongjun Cheng ◽  
Detian Li ◽  
Changkun Dong
Keyword(s):  
Field Emission ◽  
High Vacuum ◽  
Ultra High Vacuum

Investigation of Copper Segregation to the Σ5(310)/[001] Symmetric Tilt Grain Boundary in Aluminum

1999 ◽  
Vol 589 ◽  
Author(s):  
Jürgen M. Plitzko ◽  
Geoffrey H. Campbell ◽  
Wayne E. King ◽  
Stephen M. Foiles
Keyword(s):  
Electron Microscopy ◽  
Grain Boundary ◽  
Low Voltage ◽  
Theoretical Calculations ◽  
High Vacuum ◽  
Analytical Electron Microscopy ◽  
Ultra High Vacuum ◽  
Face Centered Cubic ◽  
Symmetric Tilt ◽  
Tilt Grain Boundary

AbstractThe Σ5 (31O)/[001] symmetric tilt grain boundary (STGB) in the face centered cubic (FCC) metal aluminum with 1at% copper has been studied. The model grain boundary has been fabricated by ultra-high vacuum diffusion bonding of alloy single crystals. The segregation of the copper has been encouraged by annealing the sample after bonding at 200 °C. TEM samples of this FCCmaterial were prepared with a new low voltage ion mill under very low angles.The atomic structure of the Σ5(310)/[001] STGB for this system was modeled with electronic structure calculations. These theoretical calculations of the interface structure indicate that the Cu atoms segregate to distinct sites at the interface. High resolution electron microscopy (HRTEM) and analytical electron microscopy including electron energy spectroscopic imaging and X-ray energy dispersive spectrometry have been used to explore the segregation to the grain boundary. The HRTEM images and the analytical measurements were performed using different kinds of microscopes, including a Philips CM300 FEG equipped with an imaging energy filter. The amount of the segregated species at the interface was quantified in a preliminary way. To determine the atomic positions of the segregated atoms at the interface, HRTEM coupled with image simulation and a first attempt of a holographic reconstruction from a through-focal series have been used.

Hrem Study of Ultra Thin Titanium Films

1997 ◽  
Vol 472 ◽  
Author(s):  
T. Braisaz ◽  
P. Ruterana ◽  
G. Nouet ◽  
Ph. Komninou ◽  
Th. Kehagias ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
High Vacuum ◽  
High Resolution Electron Microscopy ◽  
Zone Axis ◽  
Ultra High Vacuum ◽  
Electron Gun ◽  
Mirror Plane ◽  
Planar Defects ◽  
Resolution Electron ◽  
Order Of Magnitude

ABSTRACTHigh resolution electron microscopy has been used to characterize the structure of ultra thin films of titanium deposited on KBr substrate by Ultra High Vacuum (UHV) electron-gun evaporation. The size of the grains has an order of magnitude of 10 nm whatever the substrate temperature. The observations have been carried out along <1123> zone axis. Some of the grains contain planar defects which were identified as the twin {1011}. The atomic structure of this twin is characterized by a mirror plane similar to that observed in polycrystalline titanium. Additionaly, this structure can be modified by a b2/2 twinning dislocation.

A Field Emission Electron Microscope

1971 ◽  
Vol 29 ◽  
pp. 6-7
Author(s):  
A. Tonomura ◽  
T. Komoda
Keyword(s):  
Electron Microscope ◽  
Field Emission ◽  
High Vacuum ◽  
High Resolution Electron Microscopy ◽  
Ultra High Vacuum ◽  
Electron Optics ◽  
Ion Pumps ◽  
High Brightness ◽  
Emission Electron ◽  
Resolution Electron

We have developed a field emission electron microscope. Although field emission gun requires ultra high vacuum and skillful technique, it brings about the favorable characteristics of high brightness and small energy spread. This characteristics will enable a significant progress in coherent electron optics and high resolution electron microscopy, especially in electron beam holography.Its column is Hitachi HU-11C Electron Microscope modified for ultra high vacuum operation, and it is evacuated with five ion pumps. Field emission gun is divided into two parts and is evacuated differentially with two ion pumps and a sublimation pump. The final pressures in these rooms are 5x10-10 Torr and 5x10-8 Torr respectively.

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