Low-Cost, Atmospheric-Pressure Scanning Transmission Electron Microscopy

2011 ◽  
Vol 19 (3) ◽  
pp. 16-20
Author(s):  
Niels de Jonge ◽  
Elisabeth A. Ring ◽  
Wilbur C. Bigelow ◽  
Gabriel M. Veith

Solid materials in subambient gaseous environments have been imaged using in situ transmission electron microscopy (TEM), for example to study dynamic effects: carbon nanotube growth, nanoparticle changes during redox reactions, and phase transitions in nanoscale systems. In these studies the vacuum level in the specimen region of the electron microscope was increased to pressures of up to 10 mbar using pump-limiting apertures that separated the specimen region from the rest of the high-vacuum electron column, but it has not been possible to achieve the higher pressures that are desirable for catalysis research. TEM imaging at atmospheric pressure and at elevated temperature was achieved with 0.2-nm resolution by enclosing a gaseous environment several micrometers thick between ultra-thin, electron transparent silicon nitride windows. Although Ångström-level resolution in situ TEM has been demonstrated with aberration-corrected systems, the key difficulty with TEM imaging is its dependence on phase contrast, which requires ultra-thin specimens, limiting the choice of experiments.

Author(s):  
D. Loretto ◽  
J. M. Gibson ◽  
S. M. Yalisove

The silicides CoSi2 and NiSi2 are both metallic with the fee flourite structure and lattice constants which are close to silicon (1.2% and 0.6% smaller at room temperature respectively) Consequently epitaxial cobalt and nickel disilicide can be grown on silicon. If these layers are formed by ultra high vacuum (UHV) deposition (also known as molecular beam epitaxy or MBE) their thickness can be controlled to within a few monolayers. Such ultrathin metal/silicon systems have many potential applications: for example electronic devices based on ballistic transport. They also provide a model system to study the properties of heterointerfaces. In this work we will discuss results obtained using in situ and ex situ transmission electron microscopy (TEM).In situ TEM is suited to the study of MBE growth for several reasons. It offers high spatial resolution and the ability to penetrate many monolayers of material. This is in contrast to the techniques which are usually employed for in situ measurements in MBE, for example low energy electron diffraction (LEED) and reflection high energy electron diffraction (RHEED), which are both sensitive to only a few monolayers at the surface.


2008 ◽  
Vol 14 (S2) ◽  
pp. 436-437 ◽  
Author(s):  
G Yang ◽  
Y Zhao ◽  
K Sader ◽  
A Bleloch ◽  
RF Klie

Extended abstract of a paper presented at Microscopy and Microanalysis 2008 in Albuquerque, New Mexico, USA, August 3 – August 7, 2008


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