Role of Sulfur Incorporation in p-Type Nickel Oxide (p-NiO) on n-Type Silicon (n-Si) Photoelectrodes for Water Oxidation Reactions

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Thin films of nickel oxide (NiOx), cobalt oxide (CoOx) and nickel–cobalt oxide (NiCoOx) produced integrated, protected Si (111) photoanodes integrated, protected Si photoanodes that did not require deposition of a separate heterogeneous electrocatalyst for water oxidation.


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