Organo-Chlorinated Thin Films Deposited by Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition for Adhesion Enhancement between Rubber and Zinc-Plated Steel Monofilaments

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Atmospheric‐pressure plasma‐enhanced chemical vapor deposition of nanocomposite thin films from ethyl lactate and silica nanoparticles

Plasma Processes and Polymers ◽

10.1002/ppap.202000153 ◽

2020 ◽

Author(s):

Natalia Milaniak ◽

Gaétan Laroche ◽

Françoise Massines

Keyword(s):

Thin Films ◽

Silica Nanoparticles ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Ethyl Lactate ◽

Pressure Plasma ◽

Nanocomposite Thin Films

Atmospheric-pressure plasma-enhanced chemical vapor deposition of electrochromic organonickel oxide thin films with an atmospheric pressure plasma jet

Thin Solid Films ◽

10.1016/j.tsf.2012.11.100 ◽

2013 ◽

Vol 532 ◽

pp. 36-43 ◽

Cited By ~ 10

Author(s):

Yung-Sen Lin ◽

Di-Jiun Lin ◽

Ping-Ju Sung ◽

Shih-Wei Tien

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Plasma Jet ◽

Atmospheric Pressure Plasma Jet ◽

Oxide Thin Films ◽

Insights into the Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition of Thin Films from Methyldisiloxane Precursors

Plasma Processes and Polymers ◽

10.1002/ppap.201100157 ◽

2012 ◽

Vol 9 (11-12) ◽

pp. 1132-1143 ◽

Cited By ~ 23

Author(s):

Fiorenza Fanelli ◽

Sara Lovascio ◽

Riccardo d'Agostino ◽

Francesco Fracassi

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Deposition of SiOx thin films using hexamethyldisiloxane in atmospheric pressure plasma enhanced chemical vapor deposition

Journal of Physics Conference Series ◽

10.1088/1742-6596/1492/1/012023 ◽

2020 ◽

Vol 1492 ◽

pp. 012023

Author(s):

T Krueger ◽

L Hansen ◽

H Kersten

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Electrical Characteristics of Magnesium Doped a-IGZO RRAM: Chemical Vapor Deposition using Enhanced Atmospheric Pressure-Plasma

2020 IEEE Eurasia Conference on IOT, Communication and Engineering (ECICE) ◽

10.1109/ecice50847.2020.9301987 ◽

2020 ◽

Author(s):

Chien-Hung Wu ◽

Song-Nian Kuo ◽

Yi-Ming Chen ◽

Kow-Ming Chang ◽

Yu Yang ◽

...

Keyword(s):

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Electrical Characteristics ◽

Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition of Borophosphosilicate Glass Films

Japanese Journal of Applied Physics ◽

10.1143/jjap.47.1735 ◽

2008 ◽

Vol 47 (3) ◽

pp. 1735-1739 ◽

Cited By ~ 4

Author(s):

Minghui Yin ◽

Lingli Zhao ◽

Xiangyu Xu ◽

Shouguo Wang

Keyword(s):

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Pressure Plasma ◽

Borophosphosilicate Glass ◽

Glass Films

Surface modification of PDMS by atmospheric-pressure plasma-enhanced chemical vapor deposition and analysis of long-lasting surface hydrophilicity

Sensors and Actuators B Chemical ◽

10.1016/j.snb.2011.12.017 ◽

2012 ◽

Vol 162 (1) ◽

pp. 425-434 ◽

Cited By ~ 43

Author(s):

Donghee Lee ◽

Sung Yang

Keyword(s):

Surface Modification ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Surface Hydrophilicity ◽

Synthesis of SiOC(–H) Films by the Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition Method

e-Journal of Surface Science and Nanotechnology ◽

10.1380/ejssnt.2015.445 ◽

2015 ◽

Vol 13 (0) ◽

pp. 445-450 ◽

Cited By ~ 3

Author(s):

Takanori Mori ◽

Taiki Masuko ◽

Akira Shirakura ◽

Tetsuya Suzuki

Keyword(s):

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Characterization of Epitaxial Si Films Grown by Atmospheric Pressure Plasma Chemical Vapor Deposition Using Cylindrical Rotary Electrode

Japanese Journal of Applied Physics ◽

10.1143/jjap.45.3592 ◽

2006 ◽

Vol 45 (4B) ◽

pp. 3592-3597 ◽

Cited By ~ 15

Author(s):

Kiyoshi Yasutake ◽

Hiromasa Ohmi ◽

Hiroaki Kakiuchi ◽

Takuya Wakamiya ◽

Heiji Watanabe

Keyword(s):

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Pressure Plasma ◽

Si Films

Chain Assemblies from Nanoparticles Synthesized by Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition: The Computational View

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2015.11043 ◽

2015 ◽

Vol 15 (12) ◽

pp. 9966-9974 ◽

Cited By ~ 3

Author(s):

Maxim V. Mishin ◽

Kirill Y. Zamotin ◽

Vera S. Protopopova ◽

Sergey E. Alexandrov

Keyword(s):

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽