Ti-Doped Indium Tin Oxide Thin Films for Transparent Field-Effect Transistors: Control of Charge-Carrier Density and Crystalline Structure

2011 ◽  
Vol 3 (7) ◽  
pp. 2522-2528 ◽  
Author(s):  
Ji-In Kim ◽  
Kwang Hwan Ji ◽  
Mi Jang ◽  
Hoichang Yang ◽  
Rino Choi ◽  
...  
Keyword(s):  
Thin Films ◽  
Charge Carrier ◽  
Crystalline Structure ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Carrier Density ◽  
Field Effect ◽  
Field Effect Transistors ◽  
Charge Carrier Density ◽  
Oxide Thin Films

High-sheet-charge–carrier-density AlInN∕GaN field-effect transistors on Si(111)

2004 ◽  
Vol 85 (22) ◽  
pp. 5400-5402 ◽  
Author(s):  
A. Dadgar ◽  
F. Schulze ◽  
J. Bläsing ◽  
A. Diez ◽  
A. Krost ◽  
...  
Keyword(s):  
Charge Carrier ◽  
Carrier Density ◽  
Field Effect ◽  
Field Effect Transistors ◽  
Charge Carrier Density ◽  
Sheet Charge

scholarly journals Optically Triggered Control of the Charge Carrier Density in Chemically Functionalized Graphene Field Effect Transistors

2020 ◽  
Vol 26 (29) ◽  
pp. 6473-6478
Author(s):  
Zian Tang ◽  
Antony George ◽  
Andreas Winter ◽  
David Kaiser ◽  
Christof Neumann ◽  
...  
Keyword(s):  
Charge Carrier ◽  
Carrier Density ◽  
Field Effect ◽  
Field Effect Transistors ◽  
Charge Carrier Density ◽  
Functionalized Graphene

Plasma-assisted deposition of indium tin oxide thin films by sublimation using an anodic vacuum arc discharge

2021 ◽  
pp. 138731
Author(s):  
Bert Scheffel ◽  
Olaf Zywitzki ◽  
Thomas Preußner ◽  
Torsten Kopte
Keyword(s):  
Thin Films ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Arc Discharge ◽  
Vacuum Arc ◽  
Oxide Thin Films
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