A single-source precursor to titanium nitride thin films. Evidence for the intermediacy of imido complexes in the chemical vapor deposition process
1992 ◽
Vol 114
(3)
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pp. 1095-1097
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2010 ◽
Vol 21
(2)
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pp. 136-140
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2005 ◽
Vol 23
(6)
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pp. 1619-1625
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Keyword(s):
2011 ◽
Vol 129
(1-2)
◽
pp. 62-67
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