Tetrakis(trimethylsilyl)silane: Temperature dependence of vapor pressure, kinetics, and silicon carbide thin films by plasma-assisted liquid injection chemical vapor deposition process

Vapor Pressure ◽

Temperature Dependence ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Liquid Injection

Role of vapor pressure of 1,4-bis(trimethylsilyl)benzene in developing silicon carbide thin film using a plasma-assisted liquid injection chemical vapor deposition process

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2010.12.020 ◽

2011 ◽

Vol 205 (11) ◽

pp. 3493-3498 ◽

Cited By ~ 5

Author(s):

J. Selvakumar ◽

D. Sathiyamoorthy ◽

K.S. Nagaraja

Keyword(s):

Thin Film ◽

Silicon Carbide ◽

Vapor Pressure ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Liquid Injection

Coating of TiO2 thin films on particles by a plasma chemical vapor deposition process

Advanced Powder Technology ◽

10.1016/j.apt.2009.12.014 ◽

2010 ◽

Vol 21 (2) ◽

pp. 136-140 ◽

Cited By ~ 13

Author(s):

Dong-Joo Kim ◽

Jin-Yi Kang ◽

Kyo-Seon Kim

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Plasma Chemical ◽

Tio2 Thin Films ◽

Plasma Chemical Vapor Deposition ◽

ChemInform Abstract: A Two-Step Low Pressure Chemical Vapor Deposition Process for the Production of Tungsten Metal Thin Films.

ChemInform ◽

10.1002/chin.199838290 ◽

2010 ◽

Vol 29 (38) ◽

pp. no-no

Author(s):

D. V. BAXTER ◽

K. G. CAULTON ◽

M. H. CHISHOLM ◽

S.-H. CHUANG ◽

C. D. MINEAR

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Low Pressure ◽

Metal Thin Films ◽

Pressure Chemical ◽

Tungsten Metal

Characteristics of ferroelectric Sr0.7Bi2.1Ta2.0O9 thin films grown by liquid delivery metal organic chemical vapor deposition process

Thin Solid Films ◽

10.1016/j.tsf.2005.07.115 ◽

2005 ◽

Vol 492 (1-2) ◽

pp. 140-145 ◽

Cited By ~ 1

Author(s):

Byong-Ho Kim ◽

Dong-Kyun Kang

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Organic Chemical ◽

Metal Organic ◽

Organic Chemical Vapor Deposition ◽

OPTIMIZATION OF THE CHEMICAL VAPOR DEPOSITION PROCESS FOR THE FABRICATION OF THIN FILMS

Equipment ◽

10.1615/ihtc13.p11.60 ◽

2006 ◽

Cited By ~ 3

Author(s):

P. George ◽

Yogesh Jaluria ◽

H. C. Gea

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Conformal, Conducting Poly(3,4-ethylenedioxythiophene) Thin Films Deposited Using Bromine as the Oxidant in a Completely Dry Oxidative Chemical Vapor Deposition Process

Chemistry of Materials ◽

10.1021/cm100092c ◽

2010 ◽

Vol 22 (9) ◽

pp. 2864-2868 ◽

Cited By ~ 65

Author(s):

Hitesh Chelawat ◽

Sreeram Vaddiraju ◽

Karen Gleason

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Preparation of nanoparticle-embedded thin films by simultaneous feeding of gaseous and solid raw materials in plasma-enhanced chemical vapor deposition process

Thin Solid Films ◽

10.1016/j.tsf.2017.04.042 ◽

2017 ◽

Vol 632 ◽

pp. 55-65 ◽

Cited By ~ 1

Author(s):

Masaru Kubo ◽

Tomoya Taguchi ◽

Manabu Shimada

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Raw Materials ◽

Chemical Vapor ◽

Deposition Process ◽

A single-source precursor to titanium nitride thin films. Evidence for the intermediacy of imido complexes in the chemical vapor deposition process

Journal of the American Chemical Society ◽

10.1021/ja00029a053 ◽

1992 ◽

Vol 114 (3) ◽

pp. 1095-1097 ◽

Cited By ~ 63

Author(s):

Charles H. Winter ◽

Philip H. Sheridan ◽

T. Suren Lewkebandara ◽

Mary Jane Heeg ◽

James W. Proscia

Keyword(s):

Thin Films ◽

Titanium Nitride ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Single Source ◽

Imido Complexes ◽

Single Source Precursor

Temperature dependence of the sticking probability and molecular size of the film growth species in an atmospheric chemical vapor deposition process to form AlN from AlCl3and NH3

Applied Physics Letters ◽

10.1063/1.106406 ◽

1991 ◽

Vol 59 (20) ◽

pp. 2521-2523 ◽

Cited By ~ 34

Author(s):

H. J. Kim ◽

Y. Egashira ◽

H. Komiyama

Keyword(s):

Temperature Dependence ◽

Vapor Deposition ◽

Film Growth ◽

Chemical Vapor ◽

Molecular Size ◽

Deposition Process ◽

Sticking Probability ◽

Deposition and characterization of amorphous and micro-crystalline Si,C alloy thin films by a remote plasma-enhanced chemical-vapor deposition process - RPECVD

Journal of Non-Crystalline Solids ◽

10.1016/s0022-3093(05)80227-3 ◽

1991 ◽

Vol 137-138 ◽

pp. 741-744 ◽

Cited By ~ 11

Author(s):

C. Wang ◽

G. Lucovsky ◽

R.J. Nemanich

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Remote Plasma ◽