Mechanistic studies of copper thin-film growth from CuI and CuII .beta.-diketonates

1993 ◽  
Vol 115 (3) ◽  
pp. 1015-1024 ◽  
Author(s):  
Gregory S. Girolami ◽  
Patrick M. Jeffries ◽  
Lawrence H. Dubois
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Thin Film Growth ◽  
Mechanistic Studies ◽  
Copper Thin Film

Role of solvents in chemical vapor deposition: implications for copper thin-film growth

1993 ◽  
Vol 97 (45) ◽  
pp. 11781-11786 ◽  
Author(s):  
Chao Ming Chiang ◽  
Timothy M. Miller ◽  
Lawrence H. Dubois
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Film Growth ◽  
Chemical Vapor ◽  
Thin Film Growth ◽  
Copper Thin Film

Molecular Dynamics Simulation of Copper Thin Film Growth on β-Ta (002) Substrate

2002 ◽  
Vol 721 ◽  
Author(s):  
Youhong Li ◽  
James B. Adams
Keyword(s):  
Thin Film ◽  
Molecular Dynamics ◽  
Film Growth ◽  
Copper Film ◽  
Film Structure ◽  
Thin Film Growth ◽  
Dynamics Simulation ◽  
Copper Metallization ◽  
Copper Thin Film ◽  
Force Matching

AbstractTantalum can be used both as a diffusion barrier and an adhesion layer for copper metallization for semiconductor devices. Experiments show that β-Ta (200) substrates promote (111) texture growth in copper films. In this study, we first create an embedded atom method (EAM) Cu-Ta potential developed by our force matching method (FMM); then the potential is used for Molecular Dynamics (MD) simulations of initial copper thin film growth on β-Ta substrates. Both Cu/Ta interfacial structures and copper film structure are investigated. The relevance to (111) texturing is discussed.

scholarly journals Thin film growth of heavy fermion chiral magnet YbNi3Al9

2021 ◽  
Vol 118 (10) ◽  
pp. 102402
Author(s):  
Hiroaki Shishido ◽  
Akira Okumura ◽  
Tatsuya Saimyoji ◽  
Shota Nakamura ◽  
Shigeo Ohara ◽  
...  
Keyword(s):  
Thin Film ◽  
Heavy Fermion ◽  
Film Growth ◽  
Thin Film Growth
Sign in / Sign up

Export Citation Format

Share Document