Ultrathin Films of Poly(ethylene oxides) on Oxidized Silicon. 2. In Situ Study of Crystallization and Melting by Hot Stage AFM

2003 ◽  
Vol 36 (4) ◽  
pp. 1199-1208 ◽  
Author(s):  
Holger Schönherr ◽  
Curtis W. Frank
Keyword(s):  
Ultrathin Films ◽  
In Situ Study ◽  
Poly Ethylene

An In-Situ Study of the Segregation and the Strain Relaxation During Growth of Gold and Nickel Ultrathin Films

1999 ◽  
Vol 562 ◽  
Author(s):  
S. Labat ◽  
P. Gergaud ◽  
O. Thomas ◽  
B. Gilles ◽  
A. Marty
Keyword(s):  
Ultrathin Films ◽  
Strain Relaxation ◽  
High Energy ◽  
Stress And Strain ◽  
High Energy Electron ◽  
In Situ Study ◽  
Real Time Measurement ◽  
Ultrathin Layers ◽  
Large Asymmetry

ABSTRACTWe report on in-situ real time measurement of both stress and strain during growth of ultrathin layers, with submonolayer sensitivity. The in-plane parameter is measured by Reflection High Energy Electron Diffraction (RHEED) and the stress is determined via the measurement of the curvature. The system studied is Au/Ni (i.e. Au on Ni and Ni on Au). We have evidenced a large asymmetry in the two different growths: Au (on Ni) shows a progressive elastic strain relaxation whereas Ni (on Au) exhibits a strong interplay between the stress and the interfacial mixing.

In situ study of the Si-H bond in a-Si:H ultrathin films

1991 ◽  
pp. 566-570
Author(s):  
N. Blayo ◽  
P. Blom ◽  
B. Drevillon
Keyword(s):  
Ultrathin Films ◽  
In Situ Study

scholarly journals In situ study of the electronic structure of atomic layer deposited oxide ultrathin films upon oxygen adsorption using ambient pressure XPS

2016 ◽  
Vol 6 (18) ◽  
pp. 6778-6783 ◽  
Author(s):  
Bao-Hua Mao ◽  
Ethan Crumlin ◽  
Eric C. Tyo ◽  
Michael J. Pellin ◽  
Stefan Vajda ◽  
...  
Keyword(s):  
Electronic Structure ◽  
Ultrathin Films ◽  
Ambient Pressure ◽  
Atomic Layer ◽  
Oxygen Adsorption ◽  
Band Bending ◽  
In Situ Study ◽  
Ambient Pressure Xps ◽  
Effect Of Oxygen

APXPS was used to investigate the effect of oxygen adsorption on the band bending and electron affinity of ALD Al2O3, ZnO and TiO2 ultrathin films.

In situ study of the tensile deformation micro-mechanisms of semi-crystalline poly(ethylene terephthalate) films using synchrotron radiation X-ray scattering

Polymer ◽  
2017 ◽  
Vol 117 ◽  
pp. 268-281 ◽  
Author(s):  
Martin Donnay ◽  
Marc Ponçot ◽  
Jean-Philippe Tinnes ◽  
Thomas Schenk ◽  
Olivier Ferry ◽  
...  
Keyword(s):  
Synchrotron Radiation ◽  
Ethylene Terephthalate ◽  
Tensile Deformation ◽  
X Ray ◽  
In Situ Study ◽  
X Ray Scattering ◽  
Poly Ethylene Terephthalate ◽  
Poly Ethylene ◽  
Ray Scattering

scholarly journals A compact UHV deposition system for in situ study of ultrathin films via hard x-ray scattering and spectroscopy

2008 ◽  
Vol 79 (9) ◽  
pp. 093908 ◽  
Author(s):  
Sebastien Couet ◽  
Thomas Diederich ◽  
Kai Schlage ◽  
Ralf Röhlsberger
Keyword(s):  
Ultrathin Films ◽  
X Ray ◽  
In Situ Study ◽  
X Ray Scattering ◽  
Ray Scattering

In situ study of the Si-H bond in a-Si:H ultrathin films

1991 ◽  
Vol 170 (1-4) ◽  
pp. 566-570 ◽  
Author(s):  
N. Blayo ◽  
P. Blom ◽  
B. Drevillon
Keyword(s):  
Ultrathin Films ◽  
In Situ Study

Growth and morphology of ultrathin films: an in-situ study using scanning tunneling microscopy

1997 ◽  
Vol 381 (1) ◽  
pp. 12-17 ◽  
Author(s):  
M. Stindtmann ◽  
M. Farle ◽  
T.S. Rahman ◽  
L. Benabid ◽  
K. Baberschke
Keyword(s):  
Scanning Tunneling Microscopy ◽  
Ultrathin Films ◽  
Scanning Tunneling ◽  
Tunneling Microscopy ◽  
In Situ Study

Epitaxial growth manner and structure of superconducting oxide films

1990 ◽  
Vol 48 (4) ◽  
pp. 2-3
Author(s):  
Yoshichika Bando ◽  
Takahito Terashima ◽  
Kenji Iijima ◽  
Kazunuki Yamamoto ◽  
Kazuto Hirata ◽  
...  
Keyword(s):  
Ultrathin Films ◽  
Film Surface ◽  
High Energy ◽  
Epitaxial Films ◽  
Layer By Layer ◽  
Initial Growth ◽  
In Situ Growth ◽  
High Quality ◽  
Activated Reactive Evaporation

The high quality thin films of high-Tc superconducting oxide are necessary for elucidating the superconducting mechanism and for device application. The recent trend in the preparation of high-Tc films has been toward “in-situ” growth of the superconducting phase at relatively low temperatures. The purpose of “in-situ” growth is to attain surface smoothness suitable for fabricating film devices but also to obtain high quality film. We present the investigation on the initial growth manner of YBCO by in-situ reflective high energy electron diffraction (RHEED) technique and on the structural and superconducting properties of the resulting ultrathin films below 100Å. The epitaxial films have been grown on (100) plane of MgO and SrTiO, heated below 650°C by activated reactive evaporation. The in-situ RHEED observation and the intensity measurement was carried out during deposition of YBCO on the substrate at 650°C. The deposition rate was 0.8Å/s. Fig. 1 shows the RHEED patterns at every stage of deposition of YBCO on MgO(100). All the patterns exhibit the sharp streaks, indicating that the film surface is atomically smooth and the growth manner is layer-by-layer.

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