scholarly journals Direct Work Function Measurement by Gas Phase Photoelectron Spectroscopy and Its Application on PbS Nanoparticles

Nano Letters ◽  
2013 ◽  
Vol 13 (12) ◽  
pp. 6176-6182 ◽  
Author(s):  
Stephanus Axnanda ◽  
Marcus Scheele ◽  
Ethan Crumlin ◽  
Baohua Mao ◽  
Rui Chang ◽  
...  
Keyword(s):  
Work Function ◽  
Gas Phase ◽  
Photoelectron Spectroscopy ◽  
Function Measurement ◽  
Pbs Nanoparticles

In situ work-function measurement during chemical transformation of MoS2 to MoO3 by ambient-pressure x-ray photoelectron spectroscopy

2D Materials ◽  
2020 ◽  
Vol 7 (2) ◽  
pp. 025014
Author(s):  
Dooyong Lee ◽  
Jae Hyuck Jang ◽  
Wooseok Song ◽  
Joonhee Moon ◽  
Yooseok Kim ◽  
...  
Keyword(s):  
Work Function ◽  
Chemical Transformation ◽  
Photoelectron Spectroscopy ◽  
Ambient Pressure ◽  
Function Measurement ◽  
X Ray

scholarly journals Absolute work function measurement by using photoelectron spectroscopy

2021 ◽  
Author(s):  
Jeong Won Kim ◽  
Ansoon Kim
Keyword(s):  
Work Function ◽  
Photoelectron Spectroscopy ◽  
Function Measurement

Photoelectron Spectroscopy and Theoretical Study of AlnC5-/0 (n = 1-5) clusters: Structural Evolution, Relative Stability of Star-Like Cluster, and Planar Tetracoordinate Carbon Structure

2021 ◽  
Author(s):  
Chao-Jiang Zhang ◽  
Peng Wang ◽  
Xi-Ling Xu ◽  
Hong-Guang Xu ◽  
Weijun Zheng
Keyword(s):  
Gas Phase ◽  
Photoelectron Spectroscopy ◽  
Relative Stability ◽  
Theoretical Study ◽  
Structural Evolution ◽  
Carbon Structure ◽  
Anion Photoelectron Spectroscopy

The AlnC5- (n = 1-5) clusters were detected in the gas-phase and were investigated by mass-selected anion photoelectron spectroscopy. The structures of AlnC5-/0 (n = 1-5) were explored by theoretical...

scholarly journals Dry Etching Performance and Gas-Phase Parameters of C6F12O + Ar Plasma in Comparison with CF4 + Ar

Materials ◽  
2021 ◽  
Vol 14 (7) ◽  
pp. 1595
Author(s):  
Nomin Lim ◽  
Yeon Sik Choi ◽  
Alexander Efremov ◽  
Kwang-Ho Kwon
Keyword(s):  
Gas Phase ◽  
Photoelectron Spectroscopy ◽  
Reactive Ion Etching ◽  
Research Work ◽  
Optical Emission ◽  
Plasma Parameters ◽  
Ion Etching ◽  
Ar Plasma ◽  
Ar Gas ◽  
Etching Selectivity

This research work deals with the comparative study of C6F12O + Ar and CF4 + Ar gas chemistries in respect to Si and SiO2 reactive-ion etching processes in a low power regime. Despite uncertain applicability of C6F12O as the fluorine-containing etchant gas, it is interesting because of the liquid (at room temperature) nature and weaker environmental impact (lower global warming potential). The combination of several experimental techniques (double Langmuir probe, optical emission spectroscopy, X-ray photoelectron spectroscopy) allowed one (a) to compare performances of given gas systems in respect to the reactive-ion etching of Si and SiO2; and (b) to associate the features of corresponding etching kinetics with those for gas-phase plasma parameters. It was found that both gas systems exhibit (a) similar changes in ion energy flux and F atom flux with variations on input RF power and gas pressure; (b) quite close polymerization abilities; and (c) identical behaviors of Si and SiO2 etching rates, as determined by the neutral-flux-limited regime of ion-assisted chemical reaction. Principal features of C6F12O + Ar plasma are only lower absolute etching rates (mainly due to the lower density and flux of F atoms) as well as some limitations in SiO2/Si etching selectivity.

scholarly journals Negative ion photoelectron spectroscopy confirms the prediction that D3h carbon trioxide (CO3) has a singlet ground state

2016 ◽  
Vol 7 (2) ◽  
pp. 1142-1150 ◽  
Author(s):  
David A. Hrovat ◽  
Gao-Lei Hou ◽  
Bo Chen ◽  
Xue-Bin Wang ◽  
Weston Thatcher Borden
Keyword(s):  
Gas Phase ◽  
Ground State ◽  
Photoelectron Spectroscopy ◽  
Radical Anion ◽  
Negative Ion ◽  
Singlet Ground State

The CO3 radical anion (CO3˙−) has been formed by electrospraying carbonate dianion (CO32−) into the gas phase.

scholarly journals Change in Interface Characteristics of ITO Modified with n-decyltrimethoxysilane

Crystals ◽  
2020 ◽  
Vol 10 (8) ◽  
pp. 645
Author(s):  
Myung-Gyun Baek ◽  
Johng-Eon Shin ◽  
Dong-Hyun Hwang ◽  
Sung-Hoon Kim ◽  
Hong-Gyu Park ◽  
...  
Keyword(s):  
Contact Angle ◽  
Work Function ◽  
Indium Tin Oxide ◽  
Photoelectron Spectroscopy ◽  
Deposition Time ◽  
Interfacial Properties ◽  
Average Roughness ◽  
Light Emitting ◽  
Force Microscopy ◽  
Angle Measurements

Herein, we examined changes in the interfacial properties of organic light-emitting diodes when n-decyltrimethoxysilane (CH3SAM) was deposited on the surface of an indium tin oxide (ITO) electrode for various deposition times. It was revealed that the interfacial properties varied with deposition time. As the latter increased, so did the measured value of the contact angle, and ITO substrate exhibited a lower wettability. The contact angle measurements for bare ITO at 1, 10, 30, and 90 min were 57.41°, 63.43°, 73.76°, 81.47°, respectively, and the highest value obtained was 93.34°. In addition, the average roughness and work function of the ITO were measured using atomic force microscopy and X-ray photoelectron spectroscopy. As the deposition time of CH3SAM on the ITO substrates increased, it was evident that the former was well aligned with the latter, improving surface modification. The work function of CH3SAM, modified on the ITO substrates, improved by approximately 0.11 eV from 5.05–5.16 eV. The introduction of CH3SAM to the ITO revealed the ease of adjustment of the characteristics of ITO substrates.

Nitrosyl Isocyanate (ONNCO):  Gas-Phase Generation and a HeI Photoelectron Spectroscopy Study

2005 ◽  
Vol 44 (25) ◽  
pp. 9283-9287 ◽  
Author(s):  
Xiaoqing Zeng ◽  
Maofa Ge ◽  
Zheng Sun ◽  
Dianxun Wang
Keyword(s):  
Gas Phase ◽  
Photoelectron Spectroscopy ◽  
Spectroscopy Study

Application of photoelectron spectroscopy to molecular properties. 45. Reactivity of [(alkylthio)methylene]ketenes in the gas phase and photoelectron spectra of thiophen-3(2H)-ones

1991 ◽  
Vol 56 (10) ◽  
pp. 3445-3447 ◽  
Author(s):  
F. Chuburu ◽  
S. Lacombe ◽  
Genevieve Pfister-Guillouzo ◽  
A. Ben Cheik ◽  
J. Chuche ◽  
...  
Keyword(s):  
Gas Phase ◽  
Photoelectron Spectroscopy ◽  
Molecular Properties ◽  
Photoelectron Spectra
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