Langmuir probe potential measurements of an inductively coupled plasma: effect of radiofrequency and shield between load coil and plasma
1998 ◽
Vol 13
(8)
◽
pp. 715-720
◽
Keyword(s):
1987 ◽
Vol 2
(1)
◽
pp. 13
◽
1997 ◽
Vol 12
(7)
◽
pp. 697-701
◽
2008 ◽
Vol 18
(1)
◽
pp. 014010
◽
Keyword(s):
Deposition of SiOx coatings by inductively coupled plasma: Effect of pulsed hexamethyldisiloxan flow
2018 ◽
Vol 15
(4)
◽
pp. 1700186
◽
2004 ◽
Vol 32
(3)
◽
pp. 1344-1351
◽
Keyword(s):
1994 ◽
Vol 49
(12-14)
◽
pp. 1283-1303
◽
2014 ◽
Vol 14
(12)
◽
pp. 9534-9540
◽
Langmuir probe measurements in a low pressure inductively coupled plasma used for diamond deposition
1999 ◽
Vol 17
(3)
◽
pp. 721-725
◽
2013 ◽
Vol 724-725
◽
pp. 686-691
1991 ◽
Vol 46
(6-7)
◽
pp. 805-817
◽