NEXAFS and XPS studies of nitrosyl chloride

2015 ◽  
Vol 17 (14) ◽  
pp. 9040-9048 ◽  
Author(s):  
Luca Schio ◽  
Cui Li ◽  
Susanna Monti ◽  
Peter Salén ◽  
Vasyl Yatsyna ◽  
...  

The electronic structure of nitrosyl chloride (ClNO) has been investigated in the gas phase by X-ray Photoelectron (XPS) and Near Edge X-ray Absorption Fine Structure (NEXAFS) spectroscopy at the Cl 2p, Cl 2s, N 1s and O 1s edges in a combined experimental and theoretical study.

Nano Letters ◽  
2013 ◽  
Vol 13 (2) ◽  
pp. 824-828 ◽  
Author(s):  
Katja Henzler ◽  
Peter Guttmann ◽  
Yan Lu ◽  
Frank Polzer ◽  
Gerd Schneider ◽  
...  

2017 ◽  
Vol 710 ◽  
pp. 843-849 ◽  
Author(s):  
Turghunjan Gholam ◽  
Abduleziz Ablat ◽  
Mamatrishat Mamat ◽  
Rong Wu ◽  
Aimierding Aimidula ◽  
...  

1997 ◽  
Vol 3 (S2) ◽  
pp. 851-852
Author(s):  
H. Ade

Infrared, Raman, and fluorescence/luminescence microspectroscopy/microscopy in many instances seek to provide high sensitivity compositional and functional information that goes beyond mere elemental composition. This goal is shared by NEXAFS microscopy, in which Near Edge X-ray Absorption Fine Structure (NEXAFS) spectroscopy is employed to provide chemical sensitivity and can be relatively easily adopted in a scanning transmission x-ray microscope (STXM). In addition to compositional information, NEXAFS microscopy can exploit the dependence of x-ray absorption resonances on the bond orientation relative to the linearly polarized x rays (linear dichroism microscopy). For compositional analysis, NEXAFS microscopy is analogous to Electron Energy Loss Spectroscopy (EELS) in an electron microscope. However, when utilizing near edge spectral features, NEXAFS microscopy requires a considerable lower dose than EELS microscopy which makes it very suitable to studying radiation sensitive materials such as polymers. NEXAFS has shown to have excellent sensitivity to a wide range of moieties in polymers, including sensitivity to substitution isomerism.


2009 ◽  
Vol 130 (16) ◽  
pp. 169902
Author(s):  
G. Vall-llosera ◽  
B. Gao ◽  
A. Kivimäki ◽  
M. Coreno ◽  
J. Álvarez Ruiz ◽  
...  

2005 ◽  
Vol 7 (6) ◽  
pp. 1103 ◽  
Author(s):  
Tirandai Hemraj-Benny ◽  
Sarbajit BanerjeeCurrent address: Department ◽  
Sharadha Sambasivan ◽  
Daniel A. Fischer ◽  
Weiqiang Han ◽  
...  

2001 ◽  
Vol 105 (30) ◽  
pp. 7308-7314 ◽  
Author(s):  
G. Contini ◽  
V. Carravetta ◽  
V. Di Castro ◽  
S. Stranges ◽  
R. Richter ◽  
...  

2013 ◽  
Vol 740-742 ◽  
pp. 573-576 ◽  
Author(s):  
Wei Zeng ◽  
Zhe Chuan Feng ◽  
Rui Sheng Zheng ◽  
Ling Yun Jang ◽  
Chee Wei Liu

High-resolution synchrotron radiation X-ray absorption of Si K-edge have been employed to investigate 6H-, 4H- and 3C-SiC. Detailed analyses of the extended x-ray absorption fine structure are taken by using the IFEFFIT program, and significant results on the atomic bonding are obtained from these comparative studies. The x-ray absorption near-edge structures of the Si K-edge are investigated, and the electronic structure of 3C-, 4H- and 6H-SiC are studied. In order to investigate the angular dependence, the x-ray absorption near-edge spectra were operated at 55o and 90o of the angle between the surface and the X-ray direction.


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