Stabilization of n-cadmium telluride photoanodes for water oxidation to O2(g) in aqueous alkaline electrolytes using amorphous TiO2 films formed by atomic-layer deposition

Size effects and structural modifications in amorphous TiO2 films deposited by atomic layer deposition (ALD) were investigated. As with the previously investigated ALD-deposited Al2O3 system we found that the film’s...

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Enhanced Stability and Activity for Water Oxidation in Alkaline Media with Bismuth Vanadate Photoelectrodes Modified with a Cobalt Oxide Catalytic Layer Produced by Atomic Layer Deposition

The Journal of Physical Chemistry Letters ◽

10.1021/jz4022415 ◽

2013 ◽

Vol 4 (23) ◽

pp. 4188-4191 ◽

Cited By ~ 98

Author(s):

Michael F. Lichterman ◽

Matthew R. Shaner ◽

Sheila G. Handler ◽

Bruce S. Brunschwig ◽

Harry B. Gray ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Cobalt Oxide ◽

Water Oxidation ◽

Atomic Layer ◽

Bismuth Vanadate ◽

Alkaline Media ◽

Catalytic Layer ◽

Layer Deposition ◽

Enhanced Stability

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Low temperature temporal and spatial atomic layer deposition of TiO2 films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.4922588 ◽

2015 ◽

Vol 33 (4) ◽

pp. 041512 ◽

Cited By ~ 24

Author(s):

Morteza Aghaee ◽

Philipp S. Maydannik ◽

Petri Johansson ◽

Jurkka Kuusipalo ◽

Mariadriana Creatore ◽

...

Keyword(s):

Low Temperature ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Tio2 Films ◽

Layer Deposition ◽

Temporal And Spatial

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Correction: Enhanced photoelectrochemical water oxidation via atomic layer deposition of TiO2on fluorine-doped tin oxide nanoparticle films

Nanoscale ◽

10.1039/c5nr90125a ◽

2015 ◽

Vol 7 (28) ◽

pp. 12226-12226 ◽

Cited By ~ 2

Author(s):

Isvar A. Cordova ◽

Qing Peng ◽

Isa L. Ferrall ◽

Adam J. Rieth ◽

Paul G. Hoertz ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Tin Oxide ◽

Water Oxidation ◽

Atomic Layer ◽

Nanoparticle Films ◽

Layer Deposition ◽

Oxide Nanoparticle ◽

Photoelectrochemical Water Oxidation

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NiSx@MoS2 heterostructure prepared by atomic layer deposition as high-performance hydrogen evolution reaction electrocatalysts in alkaline media

Journal of Materials Research ◽

10.1557/jmr.2019.325 ◽

2019 ◽

Vol 35 (7) ◽

pp. 822-830 ◽

Cited By ~ 1

Author(s):

Zuyun He ◽

Zheng Guo ◽

Qingbo Wa ◽

Xiao Zhong ◽

Xinwei Wang ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Hydrogen Evolution ◽

Hydrogen Evolution Reaction ◽

High Performance ◽

Atomic Layer ◽

Alkaline Media ◽

Layer Deposition ◽

Image Position

Abstract

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Conformal SnOx heterojunction coatings for stabilized photoelectrochemical water oxidation using arrays of silicon microcones

Journal of Materials Chemistry A ◽

10.1039/d0ta01144d ◽

2020 ◽

Vol 8 (18) ◽

pp. 9292-9301

Author(s):

Ivan A. Moreno-Hernandez ◽

Sisir Yalamanchili ◽

Harold J. Fu ◽

Harry A. Atwater ◽

Bruce S. Brunschwig ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Oxide Layer ◽

Tin Oxide ◽

Water Oxidation ◽

Surface Recombination ◽

Atomic Layer ◽

Layer Deposition ◽

Photoelectrochemical Water Oxidation

A protective tin oxide layer formed by atomic-layer deposition limits surface recombination at n-Si surfaces and produces ∼620 mV of photovoltage on planar n-Si photoanodes. The layer conformally coats structures such as Si microcone arrays.

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Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition

Chemistry of Materials ◽

10.1021/acs.chemmater.8b05282 ◽

2019 ◽

Vol 31 (11) ◽

pp. 3900-3908 ◽

Cited By ~ 8

Author(s):

Jason R. Avila ◽

Syed B. Qadri ◽

Jaime A. Freitas ◽

Neeraj Nepal ◽

David R. Boris ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Growth Conditions ◽

Tio2 Films ◽

Layer Deposition ◽

Phase Selectivity

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Nanostructured resistive memory cells based on 8-nm-thin TiO2 films deposited by atomic layer deposition

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.3536487 ◽

2011 ◽

Vol 29 (1) ◽

pp. 01AD01 ◽

Cited By ~ 15

Author(s):

C. Kügeler ◽

J. Zhang ◽

S. Hoffmann-Eifert ◽

S. K. Kim ◽

R. Waser

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Tio2 Films ◽

Memory Cells ◽

Resistive Memory ◽

Layer Deposition

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Three-Dimensional Amorphous TiO2 Thin-Film Electrodes Deposited on Micro-Pillars By Spatial Atomic Layer Deposition for Li+-Ion Batteries

ECS Meeting Abstracts ◽

10.1149/ma2016-02/1/128 ◽

2016 ◽

Keyword(s):

Thin Film ◽

Atomic Layer Deposition ◽

Tio2 Thin Film ◽

Three Dimensional ◽

Atomic Layer ◽

Li Ion Batteries ◽

Layer Deposition ◽

Amorphous Tio2 ◽

Li Ion ◽

Micro Pillars

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Fowler-nordheim tunnelling in Au−TiO2−Ag film structures

Open Physics ◽

10.2478/bf02476278 ◽

2004 ◽

Vol 2 (1) ◽

Cited By ~ 2

Author(s):

J. Aarik ◽

V. Bichevin ◽

I. Jõgi ◽

H. Käämbre ◽

M. Laan ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Schottky Barrier ◽

Field Emission ◽

Atomic Layer ◽

Negative Bias ◽

Tio2 Films ◽

Au Electrode ◽

Layer Deposition ◽

Reversed Polarity ◽

Ag Film

AbstractI-V-characteristics have been measured for Au−TiO2−Ag structures with TiO2 layers of 30 and 180 nm thickness. The TiO2 films were grown by atomic layer deposition (ALD) technique. In the case of negative bias on the Au electrode, the conduction currents through TiO2 layers follow the Fowler-Nordheim formula for field emission over several orders of magnitude. The bulk of the currents may be attributed to tunnelling, seemingly through a Schottky barrier at the Au−TiO2 junction. In the case of reversed polarity the currents are also observed, but cannot be interpreted as tunnelling.

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