Role of hydrogen in the chemical vapor deposition growth of MoS2 atomic layers

Nanoscale ◽  
2015 ◽  
Vol 7 (18) ◽  
pp. 8398-8404 ◽  
Author(s):  
Xiao Li ◽  
Xinming Li ◽  
Xiaobei Zang ◽  
Miao Zhu ◽  
Yijia He ◽  
...  

In the two-step chemical vapor deposition growth of MoS2, hydrogen plays crucial roles as an inhibitor of the thermal-induced etching effect and as a promoter of desulfurization and oxidation of the obtained MoSx films.

2014 ◽  
Vol 136 (8) ◽  
pp. 3040-3047 ◽  
Author(s):  
Xiuyun Zhang ◽  
Lu Wang ◽  
John Xin ◽  
Boris I. Yakobson ◽  
Feng Ding

RSC Advances ◽  
2015 ◽  
Vol 5 (55) ◽  
pp. 44142-44148 ◽  
Author(s):  
Jun Pu ◽  
Lei Tang ◽  
Chaowei Li ◽  
Taotao Li ◽  
Lin Ling ◽  
...  

The facile and scalable technique is demonstrated, which grow graphene with controllable layers on copper foil substrates using the etching effect of H2 in atmospheric pressure chemical vapor deposition (APCVD).


ACS Nano ◽  
2011 ◽  
Vol 5 (7) ◽  
pp. 6069-6076 ◽  
Author(s):  
Ivan Vlassiouk ◽  
Murari Regmi ◽  
Pasquale Fulvio ◽  
Sheng Dai ◽  
Panos Datskos ◽  
...  

2013 ◽  
Vol 13 (8) ◽  
pp. 3490-3497 ◽  
Author(s):  
Jiri Cervenka ◽  
Desmond W. M. Lau ◽  
Nikolai Dontschuk ◽  
Olga Shimoni ◽  
Leonardo Silvestri ◽  
...  

Nanoscale ◽  
2016 ◽  
Vol 8 (14) ◽  
pp. 7646-7653 ◽  
Author(s):  
Pei Zhao ◽  
Yu Cheng ◽  
Dongchen Zhao ◽  
Kun Yin ◽  
Xuewei Zhang ◽  
...  

2011 ◽  
Vol 1 (2) ◽  
pp. 160-166 ◽  
Author(s):  
Rahul Rao ◽  
Neal Pierce ◽  
Xianfeng Zhang ◽  
Robert Wheeler ◽  
Benji Maruyama ◽  
...  

2015 ◽  
Vol 620 ◽  
pp. 87-90 ◽  
Author(s):  
Fan Ye ◽  
Xing-Min Cai ◽  
Xue Zhong ◽  
Huan Wang ◽  
Xiao-Qing Tian ◽  
...  

2015 ◽  
Vol 32 (6) ◽  
pp. 638
Author(s):  
Xingmin Cai ◽  
Xiaoqiang Su ◽  
Fan Ye ◽  
Huan Wang ◽  
Guangxing Liang ◽  
...  

2020 ◽  
Vol 13 (7) ◽  
pp. 075505
Author(s):  
Tomohiro Yamaguchi ◽  
Hiroki Nagai ◽  
Takanori Kiguchi ◽  
Nao Wakabayashi ◽  
Takuto Igawa ◽  
...  

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