Epitaxially grown single layer graphene on silicon carbide (SiC) resistive sensors were characterised for NO2 response at room and elevated temperatures, with an n-p type transition observed with increasing NO2 concentrations for all sensors. The concentration of NO2 required to cause this transition varied with different graphene samples and is attributed to varying degrees of substrate induced Fermi-level pinning above the Dirac point. The work function of a single layer device demonstrated a steady increase in work function with increasing NO2 concentration indicating no change in reaction mechanism in the concentration range measured despite a change in sensor response direction. Epitaxially grown graphene device preparation is challenging due to poor adhesion of the graphene layer to the substrate. A field effect transistor (FET) device is presented which does not require wire bonding to contacts on graphene.
Semiconducting properties of perchlorate-doped graphene using an electrochemical method
