scholarly journals Characterization and electrochemical properties of iron-doped tetrahedral amorphous carbon (ta-C) thin films

RSC Advances ◽  
2018 ◽  
Vol 8 (46) ◽  
pp. 26356-26363 ◽  
Author(s):  
Jarkko Etula ◽  
Niklas Wester ◽  
Sami Sainio ◽  
Tomi Laurila ◽  
Jari Koskinen

Surface iron levels as low as 0.4 at% (XPS) can considerably change the electrochemical properties of initially inert carbon surfaces.

2017 ◽  
Vol 225 ◽  
pp. 1-10 ◽  
Author(s):  
Tommi Palomäki ◽  
Niklas Wester ◽  
Miguel A. Caro ◽  
Sami Sainio ◽  
Vera Protopopova ◽  
...  

2019 ◽  
Vol 31 (4) ◽  
pp. 746-755 ◽  
Author(s):  
Tommi Palomäki ◽  
Miguel A. Caro ◽  
Niklas Wester ◽  
Sami Sainio ◽  
Jarkko Etula ◽  
...  

1999 ◽  
Vol 593 ◽  
Author(s):  
A.C. Ferrari ◽  
J. Robertson ◽  
R. Pastorelli ◽  
M.G. Beghi ◽  
C.E. Bottani

ABSTRACTThe elastic constants of thin Diamond-Like Carbon (DLC) films supply important information, but their measurement is difficult. Standard nanoindentation does not directly measure the elastic constants and has strong limitations particularly in the case of hard thin films on softer substrates, such as tetrahedral amorphous carbon on Si. Surface acoustic waves provide a better mean to investigate elastic properties. Surface Brillouin scattering (SBS) intrinsically probes acoustic waves of the wavelength which is appropriate to test the properties of films in the tens to hundreds of nanometers thickness range. SBS can be used to derive all the isotropic elastic constants of hard-on-soft and soft-on-hard amorphous carbon films of different kinds, with thickness down to less than 10 nm. The results help to resolve the previous uncertainties in mechanical data. The Young's modulus of tetrahedral amorphous carbon (ta-C) turns out to be lower than that of diamond, while the moduli of hydrogenated ta-C (ta-C:H) are considerably lower than those of ta-C because of the weakening effect of C-H bonding.


2002 ◽  
Vol 80 (5) ◽  
pp. 743-745 ◽  
Author(s):  
Z. R. Song ◽  
Y. H. Yu ◽  
C. L. Li ◽  
S. C. Zou ◽  
F. M. Zhang ◽  
...  

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