Erratum: GaAs/AlGaAs multiple quantum well pin diodes grown by selective area epitaxy

1988 ◽  
Vol 24 (17) ◽  
pp. 1117
Author(s):  
D.A. Roberts ◽  
J.P.R. David ◽  
G. Hill ◽  
P.A. Houston ◽  
M.A. Pate ◽  
...  
1988 ◽  
Vol 24 (14) ◽  
pp. 896
Author(s):  
D.A. Roberts ◽  
J.P.R. David ◽  
G. Hill ◽  
P.A. Houston ◽  
M.A. Pate ◽  
...  

2000 ◽  
Vol 648 ◽  
Author(s):  
Philipp Kröner ◽  
Horst Baumeister ◽  
Roland Gessner ◽  
Josef Rieger ◽  
Michael Schier ◽  
...  

AbstractLateral integration of optoelectronic devices comprising strained multiple quantum well (MQW) structures can most successfully be accomplished by selective area epitaxy using metal organic molecular beam epitaxy (MOMBE). We optimized the growth parameters with respect to a planar butt coupling and sharp, flat MQW interfaces in an integrated MQW laser / MQW modulator structure. Defect generation in metal organic vapor phase epitaxy (MOVPE) overgrown cladding layers is analyzed and shown to contain information about the quality of the buried butt coupling. A ridge waveguide structure has successfully been fabricated from an optimized integrated laser / modulator structure.


2001 ◽  
Vol 40 (Part 2, No. 9A/B) ◽  
pp. L925-L927 ◽  
Author(s):  
Masaru Kuramoto ◽  
Akitaka Kimura ◽  
Chiaki Sasaoka ◽  
Takahiro Arakida ◽  
Masaaki Nido ◽  
...  

2000 ◽  
Vol 76 (3) ◽  
pp. 273-275 ◽  
Author(s):  
J. W. Yang ◽  
A. Lunev ◽  
G. Simin ◽  
A. Chitnis ◽  
M. Shatalov ◽  
...  

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