Accurate in situ lattice matching from the dynamics of high energy electron diffraction

Applied Physics Letters ◽

10.1063/1.116696 ◽

1996 ◽

Vol 68 (3) ◽

pp. 394-396 ◽

Author(s):

J. E. Cunningham ◽

R. N. Pathak ◽

W. Y. Jan

Keyword(s):

Electron Diffraction ◽

High Energy ◽

Energy Electron ◽

High Energy Electron ◽

Lattice Matching

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In-situ characterization of II/VI molecular beam epitaxy growth using reflection high-energy electron diffraction oscillations

Journal of Crystal Growth ◽

10.1016/0022-0248(94)91270-x ◽

1994 ◽

Vol 137 (1-2) ◽

pp. 187-194 ◽

Author(s):

J.M. Gaines

Keyword(s):

Molecular Beam Epitaxy ◽

Electron Diffraction ◽

Molecular Beam ◽

High Energy ◽

Energy Electron ◽

Molecular Beam Epitaxy Growth ◽

High Energy Electron ◽

In Situ Characterization

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Reflection high-energy electron diffraction during substrate rotation: A new dimension for in situ characterization

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.589976 ◽

1998 ◽

Vol 16 (3) ◽

pp. 1507 ◽

Author(s):

W. Braun

Keyword(s):

Electron Diffraction ◽

High Energy ◽

Energy Electron ◽

High Energy Electron ◽

In Situ Characterization ◽

Substrate Rotation

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Growth of oriented Ag nanocrystals on air-oxidized Si surfaces: An in-situ reflection high energy electron diffraction study

Thin Solid Films ◽

10.1016/j.tsf.2011.01.228 ◽

2011 ◽

Vol 520 (2) ◽

pp. 853-860 ◽

Author(s):

Anupam Roy ◽

K. Bhattacharjee ◽

J.K. Dash ◽

B.N. Dev

Keyword(s):

Electron Diffraction ◽

Diffraction Study ◽

Electron Diffraction Study ◽

High Energy ◽

Energy Electron ◽

High Energy Electron

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Spectroscopies combined with reflection high-energy electron diffraction (RHEED) for real-time in situ surface monitoring of thin film growth

In Situ Characterization of Thin Film Growth ◽

10.1533/9780857094957.3.180 ◽

2011 ◽

pp. 180-211 ◽

Author(s):

P.G. Staib

Keyword(s):

Thin Film ◽

Electron Diffraction ◽

Real Time ◽

Film Growth ◽

High Energy ◽

Thin Film Growth ◽

Energy Electron ◽

High Energy Electron ◽

Surface Monitoring

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In situ growth regime characterization of cubic GaN using reflection high energy electron diffraction

Applied Physics Letters ◽

10.1063/1.2432293 ◽

2007 ◽

Vol 90 (4) ◽

pp. 041918 ◽

Author(s):

J. Schörmann ◽

S. Potthast ◽

D. J. As ◽

K. Lischka

Keyword(s):

Electron Diffraction ◽

High Energy ◽

Energy Electron ◽

In Situ Growth ◽

High Energy Electron ◽

Growth Regime ◽

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Reflection high-energy electron diffraction (RHEED) for in situ characterization of thin film growth

In Situ Characterization of Thin Film Growth ◽

10.1533/9780857094957.1.3 ◽

2011 ◽

pp. 3-28 ◽

Author(s):

G. Koster

Keyword(s):

Thin Film ◽

Electron Diffraction ◽

Film Growth ◽

High Energy ◽

Thin Film Growth ◽

Energy Electron ◽

High Energy Electron ◽

In Situ Characterization

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Initial growth mechanism of BiSrCaCuO thin films on SrTiO3(110) surfaces studied by in-situ reflection high energy electron diffraction observation

Thin Solid Films ◽

10.1016/0040-6090(93)90595-g ◽

1993 ◽

Vol 228 (1-2) ◽

pp. 189-192 ◽

Author(s):

Tadao Miura ◽

Yoshiki Ishizuka

Keyword(s):

Electron Diffraction ◽

Growth Mechanism ◽

High Energy ◽

Energy Electron ◽

Initial Growth ◽

High Energy Electron

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Investigation of GaN deposition on Si, Al2O3, and GaAs using in situ mass spectroscopy of recoiled ions and reflection high-energy electron diffraction

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.588860 ◽

1996 ◽

Vol 14 (3) ◽

pp. 2357 ◽

Author(s):

W. T. Taferner

Keyword(s):

Electron Diffraction ◽

Mass Spectroscopy ◽

High Energy ◽

Energy Electron ◽

High Energy Electron

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In situ Control of Si/Ge Growth on Stripe-Patterned Substrates Using Reflection High-Energy Electron Diffraction and Scanning Tunneling Microscopy

Nanoscale Research Letters ◽

10.1007/s11671-010-9814-8 ◽

2010 ◽

Vol 5 (12) ◽

pp. 1935-1941 ◽

Author(s):

B. Sanduijav ◽

D. G. Matei ◽

G. Springholz

Keyword(s):

Electron Diffraction ◽

Scanning Tunneling Microscopy ◽

High Energy ◽

Energy Electron ◽

Scanning Tunneling ◽

High Energy Electron ◽

Patterned Substrates ◽

Tunneling Microscopy ◽

In Situ Control

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Reproducible reflection high energy electron diffraction signatures for improvement of AlN using in situ growth regime characterization

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.2737435 ◽

2007 ◽

Vol 25 (3) ◽

pp. 1009 ◽

Author(s):

Shawn D. Burnham ◽

Gon Namkoong ◽

Kyoung-Keun Lee ◽

W. Alan Doolittle

Keyword(s):

Electron Diffraction ◽

High Energy ◽

Energy Electron ◽

In Situ Growth ◽

High Energy Electron ◽

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