High resolution imaging and lithography with hard x rays using parabolic compound refractive lenses

2002 ◽  
Vol 73 (3) ◽  
pp. 1640-1642 ◽  
Author(s):  
C. G. Schroer ◽  
B. Benner ◽  
T. F. Günzler ◽  
M. Kuhlmann ◽  
C. Zimprich ◽  
...  
Science ◽  
1982 ◽  
Vol 215 (4529) ◽  
pp. 150-152 ◽  
Author(s):  
A. Robinson

1992 ◽  
Vol 63 (10) ◽  
pp. 5086-5088 ◽  
Author(s):  
D. Ress ◽  
D. R. Ciarlo ◽  
J. E. Stewart ◽  
P. M. Bell ◽  
D. R. Kania

2021 ◽  
Author(s):  
Nicolas Bertaux ◽  
Marc Allain ◽  
John Weizeorick ◽  
Jun-Sang Park ◽  
Peter Kenesei ◽  
...  

Author(s):  
J.M. Cowley

By extrapolation of past experience, it would seem that the future of ultra-high resolution electron microscopy rests with the advances of electron optical engineering that are improving the instrumental stability of high voltage microscopes to achieve the theoretical resolutions of 1Å or better at 1MeV or higher energies. While these high voltage instruments will undoubtedly produce valuable results on chosen specimens, their general applicability has been questioned on the basis of the excessive radiation damage effects which may significantly modify the detailed structures of crystal defects within even the most radiation resistant materials in a period of a few seconds. Other considerations such as those of cost and convenience of use add to the inducement to consider seriously the possibilities for alternative approaches to the achievement of comparable resolutions.


Author(s):  
Max T. Otten ◽  
Wim M.J. Coene

High-resolution imaging with a LaB6 instrument is limited by the spatial and temporal coherence, with little contrast remaining beyond the point resolution. A Field Emission Gun (FEG) reduces the incidence angle by a factor 5 to 10 and the energy spread by 2 to 3. Since the incidence angle is the dominant limitation for LaB6 the FEG provides a major improvement in contrast transfer, reducing the information limit to roughly one half of the point resolution. The strong improvement, predicted from high-resolution theory, can be seen readily in diffractograms (Fig. 1) and high-resolution images (Fig. 2). Even if the information in the image is limited deliberately to the point resolution by using an objective aperture, the improved contrast transfer close to the point resolution (Fig. 1) is already worthwhile.


Author(s):  
Xiao Zhang

Electron holography has recently been available to modern electron microscopy labs with the development of field emission electron microscopes. The unique advantage of recording both amplitude and phase of the object wave makes electron holography a effective tool to study electron optical phase objects. The visibility of the phase shifts of the object wave makes it possible to directly image the distributions of an electric or a magnetic field at high resolution. This work presents preliminary results of first high resolution imaging of ferroelectric domain walls by electron holography in BaTiO3 and quantitative measurements of electrostatic field distribution across domain walls.


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