Pentacene thin-film transistors with Al2O3+x gate dielectric films deposited on indium-tin-oxide glass

2003 ◽  
Vol 83 (13) ◽  
pp. 2689-2691 ◽  
Author(s):  
Jiyoul Lee ◽  
J. H. Kim ◽  
Seongil Im
RSC Advances ◽  
2019 ◽  
Vol 9 (53) ◽  
pp. 30715-30719 ◽  
Author(s):  
Wei Dou ◽  
Yuanyuan Tan

Ultralow-voltage (0.8 V) thin-film transistors (TFTs) using self-assembled indium-tin-oxide (ITO) as the semiconducting layer and microporous SiO2 immersed in 5% H3PO4 for 30 minutes with huge electric-double-layer (EDL) capacitance as the gate dielectric are fabricated at room temperature.


2010 ◽  
Vol 22 (21) ◽  
pp. 2333-2337 ◽  
Author(s):  
Jun Liu ◽  
D. Bruce Buchholz ◽  
Robert P. H. Chang ◽  
Antonio Facchetti ◽  
Tobin J. Marks

2012 ◽  
Vol 520 (7) ◽  
pp. 2717-2722 ◽  
Author(s):  
Zan Zheng ◽  
Yiying Yao ◽  
Wenjian Weng ◽  
Gaorong Han ◽  
Ning Ma ◽  
...  

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