Characterization of bis(tertiary-butylamino)silane-based low-pressure chemical vapor deposition silicate glass films

2001 ◽  
Vol 19 (5) ◽  
pp. 1788 ◽  
Author(s):  
Byeongju Park ◽  
Richard Conti ◽  
Laertis Economikos ◽  
Ashima Chakravarti ◽  
James Ellenberger
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Chemical Vapor Deposition ◽  
Silicate Glass ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Pressure Chemical ◽  
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scholarly journals Characterization of TiN film grown by low-pressure-chemical-vapor-deposition

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Vol 308-309 ◽  
pp. 594-598 ◽  
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Y.J Mei ◽  
T.C Chang ◽  
J.C Hu ◽  
L.J Chen ◽  
Y.L Yang ◽  
...  
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Chemical Vapor Deposition ◽  
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Chemical Vapor ◽  
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Modulation-doped silicate glass deposited by low-pressure chemical vapor deposition

1998 ◽  
Vol 24 (5) ◽  
pp. 385-388
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M. Kraxenberger ◽  
K. Uram ◽  
N. Sandler ◽  
C. Parks ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Silicate Glass ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Pressure Chemical

Preparation and characterization of CrO2 films by Low Pressure Chemical Vapor Deposition from CrO3

2013 ◽  
Vol 539 ◽  
pp. 1-11 ◽  
Author(s):  
C. Aguilera ◽  
J.C. González ◽  
A. Borrás ◽  
D. Margineda ◽  
J.M. González ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Pressure Chemical
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