Nucleation and growth of TiSi2 thin films deposited on glass by atmospheric pressure chemical vapor deposition
2006 ◽
Vol 45
(8A)
◽
pp. 6342-6345
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Keyword(s):
2013 ◽
Vol 1
(39)
◽
pp. 6188
◽
Keyword(s):
Atmospheric Pressure Chemical Vapor Deposition of Copper Thin Films: I . Horizontal Hot Wall Reactor
1991 ◽
Vol 138
(11)
◽
pp. 3499-3504
◽
Keyword(s):
Keyword(s):
Keyword(s):
1988 ◽
Vol 17
(6)
◽
pp. 509-517
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