Heat resistance of hydrogenated amorphous silicon films prepared by compressed magnetic field‐magnetron sputtering with He and Ar gases

Journal of Applied Physics ◽

10.1063/1.336791 ◽

1986 ◽

Vol 59 (10) ◽

pp. 3604-3606 ◽

Author(s):

T. Hata ◽

Y. Kamide ◽

S. Nakagawa ◽

K. Hattori

Keyword(s):

Magnetic Field ◽

Magnetron Sputtering ◽

Heat Resistance ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Silicon Films ◽

Hydrogenated Amorphous

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Influence of different deposition parameters on the properties of hydrogenated amorphous silicon films prepared by magnetron sputtering

Journal of Non-Crystalline Solids ◽

10.1016/0022-3093(88)90427-9 ◽

1988 ◽

Vol 103 (1) ◽

pp. 143-148 ◽

Author(s):

Debajyoti Das ◽

Ratnabali Banerjee ◽

A.K. Batabyal ◽

A.K. Barua

Keyword(s):

Magnetron Sputtering ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Silicon Films ◽

Deposition Parameters ◽

Hydrogenated Amorphous

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A Simple Modification of the Magnetron Sputtering Method for Deposition of Hydrogenated Amorphous Silicon Films with Improved Optoelectronic Properties

Japanese Journal of Applied Physics ◽

10.1143/jjap.27.l1806 ◽

1988 ◽

Vol 27 (Part 2, No. 10) ◽

pp. L1806-L1808 ◽

Author(s):

A. K. Batabyal ◽

Ratnabali Banerjee ◽

A. K. Bandyopadhyay ◽

A. K. Barua

Keyword(s):

Magnetron Sputtering ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Optoelectronic Properties ◽

Silicon Films ◽

Simple Modification ◽

Hydrogenated Amorphous

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Hydrogen related crystallization in intrinsic hydrogenated amorphous silicon films prepared by reactive radiofrequency magnetron sputtering at low temperature

Thin Solid Films ◽

10.1016/j.tsf.2012.08.014 ◽

2012 ◽

Vol 522 ◽

pp. 186-192 ◽

Author(s):

D. Senouci ◽

R. Baghdad ◽

A. Belfedal ◽

L. Chahed ◽

X. Portier ◽

...

Keyword(s):

Low Temperature ◽

Magnetron Sputtering ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Silicon Films ◽

Hydrogenated Amorphous

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Effect of the hydrogen dilution on the local microstructure in hydrogenated amorphous silicon films deposited by radiofrequency magnetron sputtering

The European Physical Journal Applied Physics ◽

10.1051/epjap:2000131 ◽

2000 ◽

Vol 10 (3) ◽

pp. 185-191 ◽

Author(s):

M. Daouahi ◽

K. Zellama ◽

H. Bouchriha ◽

P. Elkaïm

Keyword(s):

Magnetron Sputtering ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Silicon Films ◽

Hydrogen Dilution ◽

Hydrogenated Amorphous

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The influence of deposition temperature and annealing temperature on the optoelectronic properties of hydrogenated amorphous silicon films

Journal of Applied Physics ◽

10.1063/1.347444 ◽

1991 ◽

Vol 69 (12) ◽

pp. 8320-8328 ◽

Author(s):

M. Kunst ◽

H.‐C. Neitzert

Keyword(s):

Amorphous Silicon ◽

Deposition Temperature ◽

Annealing Temperature ◽

Hydrogenated Amorphous Silicon ◽

Optoelectronic Properties ◽

Silicon Films ◽

Hydrogenated Amorphous

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Influence of sputtering pressure on the properties of hydrogenated amorphous‐silicon carbon alloy films prepared by magnetron sputtering of silicon in methane‐argon gas mixtures

Journal of Applied Physics ◽

10.1063/1.336995 ◽

1986 ◽

Vol 59 (7) ◽

pp. 2498-2502 ◽

Author(s):

Nobuo Saito

Keyword(s):

Magnetron Sputtering ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Gas Mixtures ◽

Argon Gas ◽

Alloy Films ◽

Silicon Carbon ◽

Sputtering Pressure ◽

Hydrogenated Amorphous

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Drive‐level capacitance profiling: Its application to determining gap state densities in hydrogenated amorphous silicon films

Applied Physics Letters ◽

10.1063/1.96129 ◽

1985 ◽

Vol 47 (4) ◽

pp. 412-414 ◽

Author(s):

C. E. Michelson ◽

A. V. Gelatos ◽

J. D. Cohen

Keyword(s):

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Drive Level ◽

Silicon Films ◽

State Densities ◽

Hydrogenated Amorphous ◽

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Catalytic doping of phosphorus and boron atoms on hydrogenated amorphous silicon films

Japanese Journal of Applied Physics ◽

10.7567/jjap.55.04es05 ◽

2016 ◽

Vol 55 (4S) ◽

pp. 04ES05 ◽

Author(s):

Junichi Seto ◽

Keisuke Ohdaira ◽

Hideki Matsumura

Keyword(s):

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Silicon Films ◽

Hydrogenated Amorphous

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Hydrogenated Amorphous Silicon Films Prepared By rf Sputtering In He/H2

10.1117/12.938346 ◽

1986 ◽

Author(s):

M L. Albers ◽

H R. Shanks ◽

J Shinar

Keyword(s):

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Rf Sputtering ◽

Silicon Films ◽

Hydrogenated Amorphous

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Effects of silicon–hydrogen bond characteristics on the crystallization of hydrogenated amorphous silicon films prepared by plasma enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582049 ◽

1999 ◽

Vol 17 (6) ◽

pp. 3240-3245 ◽

Author(s):

Hae-Yeol Kim ◽

Jae-Beom Choi ◽

Jai-Young Lee

Keyword(s):

Hydrogen Bond ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Hydrogenated Amorphous ◽

Bond Characteristics

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