Tungsten‐carbon multilayers for x‐ray optics prepared by ArF excimer‐laser‐induced chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.346684 ◽

1990 ◽

Vol 68 (3) ◽

pp. 1361-1363 ◽

Author(s):

Katsuhiko Mutoh ◽

Yuka Yamada ◽

Takashi Iwabuchi ◽

Takeo Miyata

Keyword(s):

Chemical Vapor Deposition ◽

Excimer Laser ◽

Vapor Deposition ◽

Chemical Vapor ◽

X Ray ◽

Arf Excimer Laser

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Fabrication of Tungsten-Carbon Multilayers for Soft X-Ray Optics Using Excimer-Laser-Induced Chemical Vapor Deposition Technique

Japanese Journal of Applied Physics ◽

10.1143/jjap.31.1982 ◽

1992 ◽

Vol 31 (Part 1, No. 6B) ◽

pp. 1982-1986 ◽

Author(s):

Yuka Yamada ◽

Katsuhiko Mutoh ◽

Takashi Iwabuchi ◽

Takeo Miyata

Keyword(s):

Chemical Vapor Deposition ◽

Excimer Laser ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

X Ray ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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ArF excimer laser chemical vapor deposition a-Si:H/a-AlxO1−x superlattices

Thin Solid Films ◽

10.1016/0040-6090(92)90904-p ◽

1992 ◽

Vol 218 (1-2) ◽

pp. 62-67

Author(s):

K. Uwasawa ◽

F. Ishihara ◽

S. Matsumoto

Keyword(s):

Chemical Vapor Deposition ◽

Excimer Laser ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Arf Excimer Laser

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SiC thin film preparation by ArF excimer laser chemical vapor deposition Part 1: Rate of photolysis of alkylsilanes by ArF excimer laser and their decomposition products

Thin Solid Films ◽

10.1016/0040-6090(95)08186-0 ◽

1996 ◽

Vol 274 (1-2) ◽

pp. 70-75 ◽

Author(s):

Akio Watanabe ◽

Kazuo Osato ◽

Shinji Ninomiya ◽

Masakazu Mukaida ◽

Tatsuo Tsunoda ◽

...

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Excimer Laser ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Decomposition Products ◽

Thin Film Preparation ◽

Film Preparation ◽

Arf Excimer Laser

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Surface analysis study of the oxidation of organotin films deposited by ArF excimer laser chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580916 ◽

1997 ◽

Vol 15 (5) ◽

pp. 2492-2501 ◽

Author(s):

R. Larciprete ◽

E. Borsella ◽

P. De Padova ◽

P. Perfetti ◽

C. Crotti

Keyword(s):

Chemical Vapor Deposition ◽

Surface Analysis ◽

Excimer Laser ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Analysis Study ◽

Arf Excimer Laser

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ArF excimer laser processing of plasma enhanced chemical vapor deposition silicon oxynitride thin films: Changes in deep ultraviolet transparency and composition

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.584765 ◽

1989 ◽

Vol 7 (3) ◽

pp. 429 ◽

Author(s):

J. N. Cox

Keyword(s):

Chemical Vapor Deposition ◽

Excimer Laser ◽

Vapor Deposition ◽

Laser Processing ◽

Chemical Vapor ◽

Silicon Oxynitride ◽

Deep Ultraviolet ◽

Arf Excimer Laser

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Electrical Characterization of Silicon Dioxide Thin Film Prepared by ArF Excimer Laser Chemical Vapor Deposition from Silicon Tetraacetate

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.l150 ◽

1997 ◽

Vol 36 (Part 2, No. 2A) ◽

pp. L150-L153 ◽

Author(s):

Atsushi Maruyama ◽

Kazuhiro Nakata ◽

Ken Yukimura ◽

Toshiro Maruyama

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Silicon Dioxide ◽

Excimer Laser ◽

Vapor Deposition ◽

Electrical Characterization ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Arf Excimer Laser

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Silicon Dioxide Thin Films Prepared from Silicon Tetraacetate Using ArF Excimer Laser by Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.37.4938 ◽

1998 ◽

Vol 37 (Part 1, No. 9A) ◽

pp. 4938-4942 ◽

Author(s):

Atsushi Maruyama ◽

Naoki Tanaka ◽

Kazuhiro Nakata ◽

Ken Yukimura ◽

Shinzo Yoshikado ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Dioxide ◽

Excimer Laser ◽

Vapor Deposition ◽

Chemical Vapor ◽

Arf Excimer Laser

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Improvement of corrosion resistance of carbon steel using chemical vapor deposition from Cr(CO)6 with an ArF excimer laser

Applied Physics A Solids and Surface ◽

10.1007/bf00334225 ◽

1992 ◽

Vol 55 (2) ◽

pp. 207-212 ◽

Author(s):

N. Okada ◽

Y. Katsumura ◽

K. Ishigure

Keyword(s):

Corrosion Resistance ◽

Chemical Vapor Deposition ◽

Carbon Steel ◽

Excimer Laser ◽

Vapor Deposition ◽

Chemical Vapor ◽

Arf Excimer Laser

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Reaction pathways for ArF excimer laser assisted tungsten chemical vapor deposition from a WF6–H2 gas mixture

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578669 ◽

1993 ◽

Vol 11 (6) ◽

pp. 2924-2930 ◽

Author(s):

P. Heszler ◽

J. O. Carlsson ◽

P. Mogyorósi

Keyword(s):

Chemical Vapor Deposition ◽

Excimer Laser ◽

Vapor Deposition ◽

Chemical Vapor ◽

Reaction Pathways ◽

Gas Mixture ◽

Arf Excimer Laser

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Deposits obtained by photolysis of hexamethyldisilane by ArF excimer laser (SiC thin film preparation by ArF excimer laser chemical vapor deposition, Part 2)

Thin Solid Films ◽

10.1016/s0040-6090(96)09554-5 ◽

1997 ◽

Vol 300 (1-2) ◽

pp. 95-100 ◽

Author(s):

Akio Watanabe ◽

Masakazu Mukaida ◽

Tatsuo Tsunoda ◽

Yoji Imai

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Excimer Laser ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Thin Film Preparation ◽

Film Preparation ◽

Arf Excimer Laser

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