Observation of a very high electron current extraction mode in a hollow cathode discharge

1993 ◽  
Vol 74 (1) ◽  
pp. 728-729 ◽  
Author(s):  
Ady Hershcovitch
Keyword(s):  
Hollow Cathode ◽  
Hollow Cathode Discharge ◽  
High Electron ◽  
Electron Current ◽  
Very High ◽  
High Electron Current

Cross-comparison of diagnostic and 0D modeling of a micro-hollow cathode discharge in the stationary regime in an Ar/N2 gas mixture

2021 ◽  
Author(s):  
Alice Remigy ◽  
Salima Kasri ◽  
Thibault Darny ◽  
Hiba Kabbara ◽  
Ludovic William ◽  
...  
Keyword(s):  
Hollow Cathode ◽  
Ultra Violet ◽  
Hollow Cathode Discharge ◽  
Tunable Diode Laser ◽  
Physical Parameters ◽  
Gas Mixture ◽  
High Electron ◽  
Experimental Conditions ◽  
Wide Range ◽  
Averaged Model

Abstract A micro-hollow cathode discharge (MHCD) operated in Ar/N2 gas mixture, working in the normal regime, was studied both experimentally and with a 0D (volume-averaged) model in this work. This source provides high electron densities (up to 1015 cm-3) at low injected power (1W). To understand the mechanisms leading to the production of N atoms, the densities of electrons, N atoms and argon metastable atoms (Ar*) were monitored over a wide range of experimental conditions. Electrons, N atoms and Ar* densities were probed by means of Optical Emission Spectroscopy (OES), Vacuum Ultra Violet Fourier Transform Spectroscopy (VUV FTS) and Tunable Diode Laser Absorption Spectroscopy (TDLAS), respectively. Measurements showed that using a smaller hole diameter enables to work with less injected power, while increasing the power density inside the hole and, subsequently, increasing the densities of excited species. Varying the percentage of N2 in the gas mixture highlighted that, up to 80%, the density of N atoms increases although the dissociation rate drops. Looking at the processes involved in the production of N atoms with the help of the 0D model, we found that at very low N2 fraction, N atoms are mostly produced through dissociative electron-ion recombination. However, adding more N2 decreases drastically the electron density. The density of N atoms does not drop thanks to the contribution of Ar* atoms, which are the main species dissociating N2 between 5 and 55% of N2 in the gas mixture. A reasonable agreement is found between the experiments and the model results. This study shows that, with this MHCD, it is possible to significantly modify the production of N atoms when modifying the physical parameters, making it particularly relevant for applications requiring a N atoms source, such as nitride deposition.

Generation of nitrogen beams with very high N+/N2+ ratio using hollow cathode discharge

Vacuum ◽  
2005 ◽  
Vol 77 (2) ◽  
pp. 157-162 ◽  
Author(s):  
Hong Shen ◽  
Zongyi Qin ◽  
Yu Zhang ◽  
Lan Mi ◽  
Peng Xu ◽  
...  
Keyword(s):  
Hollow Cathode ◽  
Hollow Cathode Discharge ◽  
Very High

scholarly journals Main magnetic focus ion source: Device with high electron current density

2021 ◽  
Vol 502 ◽  
pp. 23-28
Author(s):  
V.P. Ovsyannikov ◽  
A.V. Nefiodov ◽  
A.Yu. Boytsov ◽  
A.Yu. Ramzdorf ◽  
V.I. Stegailov ◽  
...  
Keyword(s):  
Current Density ◽  
Ion Source ◽  
High Electron ◽  
Electron Current ◽  
Electron Current Density ◽  
High Electron Current

scholarly journals Tin Whisker Growth Induced by High Electron Current Density

2007 ◽  
Vol 37 (1) ◽  
pp. 17-22 ◽  
Author(s):  
Y. W. Lin ◽  
Yi-Shao Lai ◽  
Y. L. Lin ◽  
Chun-Te Tu ◽  
C. R. Kao
Keyword(s):  
Current Density ◽  
Whisker Growth ◽  
High Electron ◽  
Electron Current ◽  
Tin Whisker ◽  
Electron Current Density ◽  
High Electron Current

Comparison of plasma characteristics of high-power pulsed sputtering glow discharge and hollow-cathode discharge

2020 ◽  
Vol 60 (1) ◽  
pp. 015501
Author(s):  
Shoki Abe ◽  
Katsuyuki Takahashi ◽  
Seiji Mukaigawa ◽  
Koichi Takaki ◽  
Ken Yukimura
Keyword(s):  
Glow Discharge ◽  
High Power ◽  
Hollow Cathode ◽  
Hollow Cathode Discharge ◽  
Plasma Characteristics

Effect of aging the hollow cathode by sputtering on the analytical precision of the hollow cathode discharge emission source

1992 ◽  
Vol 64 (17) ◽  
pp. 1831-1835 ◽  
Author(s):  
Jih Lie. Tseng ◽  
Jau Yurn. Kung ◽  
J. C. Williams ◽  
Steven T. Griffin
Keyword(s):  
Hollow Cathode ◽  
Hollow Cathode Discharge ◽  
Emission Source ◽  
Analytical Precision
Sign in / Sign up

Export Citation Format

Share Document