A Monte Carlo simulation of anisotropic electron transport in silicon including full band structure and anisotropic impact‐ionization model

1994 ◽  
Vol 75 (1) ◽  
pp. 297-312 ◽  
Author(s):  
T. Kunikiyo ◽  
M. Takenaka ◽  
Y. Kamakura ◽  
M. Yamaji ◽  
H. Mizuno ◽  
...  
1994 ◽  
Vol 75 (7) ◽  
pp. 3500-3506 ◽  
Author(s):  
Y. Kamakura ◽  
H. Mizuno ◽  
M. Yamaji ◽  
M. Morifuji ◽  
K. Taniguchi ◽  
...  

1996 ◽  
Vol 79 (5) ◽  
pp. 2473-2480 ◽  
Author(s):  
H. K. Jung ◽  
K. Taniguchi ◽  
C. Hamaguchi

1991 ◽  
Vol 69 (4) ◽  
pp. 2300-2311 ◽  
Author(s):  
R. Thoma ◽  
H. J. Peifer ◽  
W. L. Engl ◽  
W. Quade ◽  
R. Brunetti ◽  
...  

1999 ◽  
Vol 4 (S1) ◽  
pp. 781-786
Author(s):  
E. Bellotti ◽  
B. Doshi ◽  
K. F. Brennan ◽  
P. P. Ruden

Ensemble Monte Carlo calculations of electron transport at high applied electric field strengths in bulk, wurtzite phase InN are presented. The calculations are performed using a full band Monte Carlo simulation that includes a pseudopotential band structure, all of the relevant phonon scattering agents, and numerically derived impact ionization transition rates. The full details of the first five conduction bands, which extend in energy to about 8 eV above the conduction band minimum, are included in the simulation. The electron initiated impact ionization coefficients and quantum yield are calculated using the full band Monte Carlo model. Comparison is made to previous calculations for bulk GaN and ZnS. It is found that owing to the narrower band gap in InN, a lower breakdown field exists than in either GaN or ZnS.


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