Determining factor of effective work function in metal/bi-layer high-k gate stack structure studied by photoemission spectroscopy

2012 ◽  
Vol 100 (11) ◽  
pp. 112906 ◽  
Author(s):  
S. Toyoda ◽  
H. Kumigashira ◽  
M. Oshima ◽  
H. Sugaya ◽  
H. Morita
Keyword(s):  
Work Function ◽  
Photoemission Spectroscopy ◽  
Gate Stack ◽  
Effective Work ◽  
Effective Work Function ◽  
High K ◽  
Determining Factor

Behavior of Effective Work Function in Metal/High-K Gate Stack under High Temperature Process

2004 ◽  
Author(s):  
Moon Sig Joo ◽  
Byung Jin Cho ◽  
D. Z. Chi ◽  
N. Balasubramanian ◽  
D.-L. Kwong
Keyword(s):  
High Temperature ◽  
Work Function ◽  
Gate Stack ◽  
Effective Work ◽  
Effective Work Function ◽  
High Temperature Process ◽  
High K

Investigating doping effects on high-κ metal gate stack for effective work function engineering

2013 ◽  
Vol 88 ◽  
pp. 21-26 ◽  
Author(s):  
C. Leroux ◽  
S. Baudot ◽  
M. Charbonnier ◽  
A. Van Der Geest ◽  
P. Caubet ◽  
...  
Keyword(s):  
Work Function ◽  
Metal Gate ◽  
Gate Stack ◽  
Effective Work ◽  
Effective Work Function ◽  
Doping Effects

Interface dipole and effective work function of Re in Re∕HfO2∕SiOx∕n-Si gate stack

2006 ◽  
Vol 88 (7) ◽  
pp. 072907 ◽  
Author(s):  
Y. Liang ◽  
J. Curless ◽  
C. J. Tracy ◽  
D. C. Gilmer ◽  
J. K. Schaeffer ◽  
...  
Keyword(s):  
Work Function ◽  
Gate Stack ◽  
Effective Work ◽  
Effective Work Function ◽  
Interface Dipole
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