Optoelectronic and structural properties of amorphous silicon–carbon alloys deposited by low-power electron-cyclotron resonance plasma-enhanced chemical-vapor deposition

Low Power ◽

Amorphous Silicon ◽

Structural Properties ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Silicon Carbon ◽

Radical Fluxes in Electron Cyclotron Resonance Plasma Chemical Vapor Deposition of Amorphous Silicon

Japanese Journal of Applied Physics ◽

10.1143/jjap.34.5965 ◽

1995 ◽

Vol 34 (Part 1, No. 11) ◽

pp. 5965-5970 ◽

Cited By ~ 3

Author(s):

Mei Zhang ◽

Yoshikazu Nakayama

Keyword(s):

Amorphous Silicon ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

A Study on the Relation between Film Quality and Deposition Rate for Amorphous Silicon Films Grown by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition Using H 2/SiH 4

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.l986 ◽

1997 ◽

Vol 36 (Part 2, No. 8A) ◽

pp. L986-L988

Author(s):

Moonsang Kang ◽

Jaeyeong Kim ◽

Taehoon Lim ◽

Inhwan Oh ◽

Bupju Jeon ◽

...

Keyword(s):

Amorphous Silicon ◽

Deposition Rate ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

RF bias effects on properties of hydrogenated amorphous silicon deposited by electron cyclotron resonance plasma-enchanced chemical vapor deposition

10.1117/12.304500 ◽

1998 ◽

Author(s):

Yoshiyuki Hirano ◽

Fumio Sato ◽

Ahalapitiya H. Jayatissa ◽

Hiroshi Ohtake ◽

Kuniharu Takizawa

Keyword(s):

Amorphous Silicon ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Hydrogenated Amorphous ◽

Amorphous and Microcrystalline Silicon Deposited by Low-Power Electron-Cyclotron Resonance Plasma-Enhanced Chemical-Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.38 ◽

1997 ◽

Vol 36 (Part 1, No. 1A) ◽

pp. 38-49 ◽

Cited By ~ 11

Author(s):

João Pedro Conde ◽

Volker Schotten ◽

Safwan Arekat ◽

Pedro Brogueira ◽

Rui Sousa ◽

...

Keyword(s):

Low Power ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Microcrystalline Silicon ◽

Effect of nitrogen flow on the properties of carbon nitride films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Vacuum ◽

10.1016/j.vacuum.2021.110223 ◽

2021 ◽

pp. 110223

Author(s):

Sixu Lin ◽

Dong Xie ◽

Yongliang Tang ◽

Yiwen Wang ◽

Fengjuan Jing ◽

...

Keyword(s):

Vapor Deposition ◽

Cyclotron Resonance ◽

Carbon Nitride ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Nitrogen Flow ◽

c-Axis oriented AlN films prepared on diamond film substrate by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/s0022-0248(01)01810-3 ◽

2002 ◽

Vol 235 (1-4) ◽

pp. 333-339 ◽

Cited By ~ 7

Author(s):

H Gong ◽

X Jiang

Keyword(s):

Diamond Film ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Film Substrate ◽

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

In situ investigation of the passivation of Si and Ge by electron cyclotron resonance plasma enhanced chemical vapor deposition of SiO2

10.1116/1.589211 ◽

1996 ◽

Vol 14 (3) ◽

pp. 1687 ◽

Cited By ~ 9

Author(s):

Y. Wang

Keyword(s):

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

In Situ Investigation ◽

Low‐temperature homoepitaxial growth of Si by electron cyclotron resonance plasma enhanced chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.114962 ◽

1995 ◽

Vol 67 (7) ◽

pp. 971-973 ◽

Cited By ~ 21

Author(s):

J. L. Rogers ◽

P. S. Andry ◽

W. J. Varhue ◽

P. McGaughnea ◽

E. Adams ◽

...

Keyword(s):

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Homoepitaxial Growth ◽

Preparation of Bismuth Titanate Films by Electron Cyclotron Resonance Plasma Sputtering-Chemical Vapor Deposition

Journal de Physique IV (Proceedings) ◽

10.1051/jphyscol:1995580 ◽

1995 ◽

Vol 05 (C5) ◽

pp. C5-671-C5-677

Author(s):

H. Masumoto ◽

T. Hirai

Keyword(s):

Vapor Deposition ◽

Cyclotron Resonance ◽

Bismuth Titanate ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Sputtering ◽

Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution

Journal of Applied Physics ◽

10.1063/1.1500418 ◽

2002 ◽

Vol 92 (5) ◽

pp. 2937-2941 ◽

Cited By ~ 41

Author(s):

K. Chew ◽

Rusli ◽

S. F. Yoon ◽

J. Ahn ◽

V. Ligatchev ◽

...

Keyword(s):

Silicon Carbide ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Hydrogen Dilution ◽

Hydrogenated Amorphous