Influence of postdeposition annealing on the enhanced structural and electrical properties of amorphous and crystalline Ta2O5 thin films for dynamic random access memory applications
2016 ◽
Vol 52
(8)
◽
pp. 788-795
◽
Keyword(s):
1993 ◽
Vol 3
(2)
◽
pp. 113-120
◽
1999 ◽
Vol 17
(4)
◽
pp. 1861-1865