Influence of postdeposition annealing on the enhanced structural and electrical properties of amorphous and crystalline Ta2O5 thin films for dynamic random access memory applications

1999 ◽  
Vol 86 (2) ◽  
pp. 871-880 ◽  
Author(s):  
P. C. Joshi ◽  
M. W. Cole
1999 ◽  
Vol 74 (21) ◽  
pp. 3194-3196 ◽  
Author(s):  
B. Nagaraj ◽  
T. Sawhney ◽  
S. Perusse ◽  
S. Aggarwal ◽  
R. Ramesh ◽  
...  

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