Measurement of deposition rate and ion energy distribution in a pulsed dc magnetron sputtering system using a retarding field analyzer with embedded quartz crystal microbalance
2016 ◽
Vol 87
(4)
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pp. 043511
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2012 ◽
Vol 03
(09)
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pp. 645-649
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2003 ◽
Vol 42
(Part 1, No. 11)
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pp. 7086-7090
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1997 ◽
Keyword(s):
2013 ◽
Vol 586
(1)
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pp. 168-178