Measurement of deposition rate and ion energy distribution in a pulsed dc magnetron sputtering system using a retarding field analyzer with embedded quartz crystal microbalance

2016 ◽  
Vol 87 (4) ◽  
pp. 043511 ◽  
Author(s):  
Shailesh Sharma ◽  
David Gahan ◽  
Paul Scullin ◽  
James Doyle ◽  
Jj Lennon ◽  
...  
Vacuum ◽  
2021 ◽  
Vol 188 ◽  
pp. 110200
Author(s):  
Sihui Wang ◽  
Wei Wei ◽  
Yonghao Gao ◽  
Haibin Pan ◽  
Yong Wang

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