Plasma Properties and Ion Energy Distribution in DC Magnetron Sputtering Assisted by Inductively Coupled RF Plasma

2003 ◽  
Vol 42 (Part 1, No. 11) ◽  
pp. 7086-7090 ◽  
Author(s):  
Zhuguo Li ◽  
Shoji Miyake ◽  
Masakazu Mori
Keyword(s):  
Magnetron Sputtering ◽  
Energy Distribution ◽  
Rf Plasma ◽  
Dc Magnetron Sputtering ◽  
Plasma Properties ◽  
Ion Energy ◽  
Ion Energy Distribution ◽  
Inductively Coupled

scholarly journals Ion Energy Distribution during Magnetron Sputtering Enhanced with an Inductively Coupled rf Plasma.

Shinku ◽  
1998 ◽  
Vol 41 (3) ◽  
pp. 147-150 ◽  
Author(s):  
Masamichi MATSUURA ◽  
Tadashi YAMAMOTO ◽  
Tadashi MORITA ◽  
Toshiharu KURAUCHI
Keyword(s):  
Magnetron Sputtering ◽  
Energy Distribution ◽  
Rf Plasma ◽  
Ion Energy ◽  
Ion Energy Distribution ◽  
Inductively Coupled

scholarly journals Dependence of Ar+ and Ti+ Ion Energy Distribution on dc Self Bias of the rf Inductive Coil in Inductively-coupled rf Plasma Enhanced Magnetron Sputtering.

Shinku ◽  
1999 ◽  
Vol 42 (3) ◽  
pp. 409-412
Author(s):  
Takayoshi SAITOH ◽  
Suguru SAIKI ◽  
Toshiki KOBAYASHI ◽  
Kazuhiro FUKUSHIMA ◽  
Naoto KIKUCHI ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Energy Distribution ◽  
Rf Plasma ◽  
Ion Energy ◽  
Ion Energy Distribution ◽  
Inductively Coupled ◽  
Self Bias
Sign in / Sign up

Export Citation Format

Share Document