Enhanced photoresponse of Ge/Si nanostructures by combining amorphous silicon deposition and annealing

Journal of Applied Physics ◽

10.1063/1.5029948 ◽

2018 ◽

Vol 124 (9) ◽

pp. 095703 ◽

Author(s):

A. Podolian ◽

A. Nadtochiy ◽

O. Korotchenkov ◽

B. Romanyuk ◽

V. Melnik ◽

...

Keyword(s):

Amorphous Silicon ◽

Silicon Deposition ◽

Si Nanostructures

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The Dependence of Field Effect Mobilities on Substrate Temperature for Amorphous Silicon Deposition for Amorphous Silicon Thin Film Transistors

Japanese Journal of Applied Physics ◽

10.1143/jjap.27.l2010 ◽

1988 ◽

Vol 27 (Part 2, No. 11) ◽

pp. L2010-L2012 ◽

Author(s):

Keiji Oyoshi ◽

Yukihisa Kusuda ◽

Tomonori Yamaoka ◽

Shuhei Tanaka

Keyword(s):

Thin Film ◽

Substrate Temperature ◽

Amorphous Silicon ◽

Thin Film Transistors ◽

Field Effect ◽

Silicon Thin Film ◽

Silicon Deposition

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Segmented Modeling of Large-Area VHF PECVD Thin-Film Amorphous Silicon Deposition System

ECS Meeting Abstracts ◽

10.1149/ma2011-02/29/1978 ◽

2011 ◽

Keyword(s):

Thin Film ◽

Amorphous Silicon ◽

Silicon Deposition

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Hydrogen incorporation in the early stages of hydrogenated amorphous silicon deposition evaluated by real time infrared reflectance spectroscopy

Applied Physics Letters ◽

10.1063/1.110024 ◽

1993 ◽

Vol 63 (4) ◽

pp. 461-463 ◽

Author(s):

M. Katiyar ◽

G. F. Feng ◽

Y. H. Yang ◽

J. R. Abelson ◽

N. Maley

Keyword(s):

Amorphous Silicon ◽

Real Time ◽

Hydrogenated Amorphous Silicon ◽

Reflectance Spectroscopy ◽

Infrared Reflectance ◽

Silicon Deposition ◽

Hydrogen Incorporation ◽

Infrared Reflectance Spectroscopy ◽

Early Stages ◽

Hydrogenated Amorphous

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Amorphous silicon deposition temperature optimization on advanced polysilicon thin-film formation using metal-induced lateral crystallization technology

Proceedings 2002 IEEE Hong Kong Electron Devices Meeting (Cat No 02TH8616) HKEDM-02 ◽

10.1109/hkedm.2002.1029149 ◽

2003 ◽

Author(s):

W.M. Cheung ◽

C.F. Cheng ◽

M.C. Poon ◽

C.W. Kok ◽

M. Chan

Keyword(s):

Thin Film ◽

Amorphous Silicon ◽

Deposition Temperature ◽

Film Formation ◽

Silicon Deposition ◽

Temperature Optimization ◽

Thin Film Formation ◽

Lateral Crystallization

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The effect of ion-surface and ion-bulk interactions during hydrogenated amorphous silicon deposition

Journal of Applied Physics ◽

10.1063/1.2786873 ◽

2007 ◽

Vol 102 (7) ◽

pp. 073523 ◽

Author(s):

A. H. M. Smets ◽

W. M. M. Kessels ◽

M. C. M. van de Sanden

Keyword(s):

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Silicon Deposition ◽

Hydrogenated Amorphous

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Ion‐induced secondary electron emission in SiH4glow discharge, and temperature dependence of hydrogenated amorphous silicon deposition rate

Journal of Applied Physics ◽

10.1063/1.353070 ◽

1993 ◽

Vol 73 (5) ◽

pp. 2578-2580 ◽

Author(s):

Christian Böhm ◽

Jérôme Perrin ◽

Pere Roca i Cabarrocas

Keyword(s):

Temperature Dependence ◽

Amorphous Silicon ◽

Deposition Rate ◽

Electron Emission ◽

Secondary Electron ◽

Secondary Electron Emission ◽

Hydrogenated Amorphous Silicon ◽

Silicon Deposition ◽

Hydrogenated Amorphous

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Hot-wire produced atomic hydrogen: effects during and after amorphous-silicon deposition

Thin Solid Films ◽

10.1016/s0040-6090(01)01215-9 ◽

2001 ◽

Vol 395 (1-2) ◽

pp. 87-91 ◽

Author(s):

A.M Brockhoff ◽

W.F van der Weg ◽

F.H.P.M Habraken

Keyword(s):

Amorphous Silicon ◽

Atomic Hydrogen ◽

Hot Wire ◽

Silicon Deposition

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Fundamental mechanisms in silane plasma decompositions and amorphous silicon deposition

Journal of Non-Crystalline Solids ◽

10.1016/0022-3093(83)90257-0 ◽

1983 ◽

Vol 59-60 ◽

pp. 649-657 ◽

Author(s):

J.P.M. Schmitt

Keyword(s):

Amorphous Silicon ◽

Silicon Deposition ◽

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Novel Plasma Reactor Principle for Amorphous Silicon Deposition Enabling High Efficiency Energy Conversion

60th Annual Technical Conference Proceedings ◽

10.14332/svc17.proc.42979 ◽

2018 ◽

Author(s):

Sebastian Gatz ◽

Keyword(s):

Energy Conversion ◽

Amorphous Silicon ◽

High Efficiency ◽

Plasma Reactor ◽

Silicon Deposition

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Amorphous silicon deposition: Industrial and technical challenges

Thin Solid Films ◽

10.1016/0040-6090(89)90889-4 ◽

1989 ◽

Vol 174 ◽

pp. 193-202 ◽

Author(s):

J.P.M. Schmitt

Keyword(s):

Amorphous Silicon ◽

Silicon Deposition ◽

Technical Challenges

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