Strong thermal conductivity dependence on arsenic-vacancy complex formation in arsenic-doped silicon

2019 ◽  
Vol 126 (19) ◽  
pp. 195104
Author(s):  
Yongjin Lee ◽  
Gyeong S. Hwang
Author(s):  
Gerhard Pensl ◽  
Frank Schmid ◽  
Sergey A. Reshanov ◽  
Heiko B. Weber ◽  
M. Bockstedte ◽  
...  

2003 ◽  
Vol 94 (5) ◽  
pp. 3201-3205 ◽  
Author(s):  
P. Kivinen ◽  
A. Savin ◽  
M. Zgirski ◽  
P. Törmä ◽  
J. Pekola ◽  
...  

2019 ◽  
Vol 31 (12) ◽  
pp. 125401 ◽  
Author(s):  
Haohua Wen ◽  
Yifeng Wu ◽  
Jianyi Liu ◽  
Yue Zheng

2001 ◽  
Vol 64 (19) ◽  
Author(s):  
M. S. Janson ◽  
A. Hallén ◽  
M. K. Linnarsson ◽  
B. G. Svensson

1986 ◽  
Vol 10-12 ◽  
pp. 299-303 ◽  
Author(s):  
Hans Jürgen von Bardeleben ◽  
J.C. Bourgoin ◽  
A. Miret

Author(s):  
M. Asheghi ◽  
K. E. Goodson

Simulation of the temperature field in Silicon-on-insulator (SOI) transistors can benefit from better models and data for thermal conduction in pure and doped semiconducting materials. This work develops simple algebraic expressions to account for the reduction in thermal conductivity due to the size effect and to the presence of dopant impurities. The model applies to temperatures above 300 K and the results are compared with experimental data for pure and doped silicon layers.


1992 ◽  
Vol 123 (3-4) ◽  
pp. 529-536 ◽  
Author(s):  
I.A. Bobrovnikova ◽  
L.G. Lavrent'eva ◽  
M.P. Rusaikin ◽  
M.D. Vilisova

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